基于腔内倍频的457 nm激光器高反射腔镜的研制  

Fabrication of High-Reflective Cavity Mirrors for 457 nm Laser Based on Intracavity Frequency Doubling

作　　者：刘冬梅[1] 李五一 付秀华[1] 张静[1] 张功 Liu Dongmei;Li Wuyi;Fu Xiuhua;Zhang Jing;Zhang Gong(School of Electro-Optical Engineering,Changchun University of Science and Technology Changchun,Jilin 130022,China)

机构地区：[1]长春理工大学光电工程学院,吉林长春130022

出　　处：《中国激光》2018年第11期132-136,共5页Chinese Journal of Lasers

基　　金：国家重点研发计划(2018YFB1107500);吉林省科技发展计划项目(20150204047GX);吉林省重大科技攻关专项(20140203002GX)

摘　　要：基于倍频反射膜的设计理论,结合膜系设计软件实现了多波段激光腔面高反射膜的设计。在制备过程中,基于最小二乘法原理建立了残余蒸镀量与膜层厚度之间的关系式,解决了膜厚控制误差累积导致薄膜光谱性能变差的问题。制备的薄膜在457 nm和914 nm波长处的反射率分别为99.9%和99.6%,在808,1064,1342 nm波长处的透射率分别为97.2%、96.8%和93.1%,满足457 nm激光器的使用要求。Based on the design theory of frequency doubling reflective films, the design of multi-band high-reflective films on laser cavity surface is realized with the film design software. In the fabrication process, the deterioration problem of the thin film spectral performance caused by the accumulation of the film thickness control error is solved based on the relationship between the residual evaporation amount and the film thickness established by the least square method. The reflectivity of the fabricated thin films at 457 nm and 914 nm is 99.9% and 99.6%, and the transmissivity at 808 nm, 1064 nm and 1342 nm is 97.2%, 96.8% and 93.1%, respectively, which satisfies the requirements of the 457 nm laser.

关 键 词：薄膜 腔面高反射膜 倍频反射 膜厚控制 最小二乘法 

分 类 号：O484[理学—固体物理]