表面带C=C端基活性膜SiO_2复合体的研究  

A study on the silica composite with active membrane containing C=C end group on the surface

作　　者：闻荻江[1] 朱新生[1] 李敏[1] 

机构地区：[1]苏州大学材料工程学院,江苏苏州215021

出　　处：《武汉化工学院学报》2002年第3期37-39,共3页Journal of Wuhan Institute of Chemical Technology

基　　金：江苏省科委自然科学基金;江苏省有机重点实验室和薄膜材料重点实验室的资助

摘　　要：利用甲基丙烯酰氧丙基三甲氧基硅烷合成了带 C=C端基的活性膜 / Si O2 复合体 ,探讨了其表面结构 .XPS表征表明 ,Si O2 表面的有机硅烷牢固结合 ,扫描电镜表征了硅烷化后 Si O2 表面的膜结构 。An active membrane/silica composite containing C=C end group were prepared with methacryltrimethoxysilane. The surface structure of the composite was studied. It is showed that organic silane was combined strongly on the surface of silica by XPS. It is evidenced by SEM that surface membrane structure were formed after the silanization of silica,and the porous characteristic were remained.

关 键 词：C=C端基 多孔SIO2 甲基丙烯酰氧丙基三甲氧基硅烷 表面活性膜 合成技术 

分 类 号：O647.11[理学—物理化学]