聚阿魏酸修饰电极的电化学特性及电催化性能  

Electrochemical Characteristics and Catalytic Properties of Poly (ferulic acid) Glassy Carbon Modified Electrode

作　　者：张玉忠[1] 赵红[1] 袁倬斌[1] 

机构地区：[1]中国科学技术大学研究生院化学部,北京100039

出　　处：《物理化学学报》2002年第9期841-845,共5页Acta Physico-Chimica Sinica

基　　金：国家自然科学基金(29875027)资助项目~~

摘　　要：研究了阿魏酸在玻碳电极表面电聚合成膜的方法和条件,测量了应用电化学方法制备不同厚度的阿魏酸修饰电极的循环伏安行为及其它电化学性质.对厚度为0.5μm的阿魏酸膜,测得的电子转移系数为0.49,表观电极反应速率常数(ks)为6.56s-1.扩散系数DR为7.9×108cm2·s-1,Do为4.48×108cm2·s-1.该修饰电极对烟酰胺腺嘌呤二核苷酸(NADH)氧化具有很好的催化作用.NADH浓度在0.01～5.0mmol·dm-3范围内与峰电流呈现良好的线性关系.The method and conditions of preparing ferulic acid film at glassy carbon electrode by electropolymerization have been studied.The electrochemical characteristics and charge transmission process in films have been explored initially with cyclic voltammetry,staircase voltammetry and A.C.impedance.The apparent electron transfer coefficient and standard rate constant (ks) was o.49 and 6.56 s-1 for poly (ferulic acid) film (L=0.5 μm) respectively.The diffusion coefficients within the film is 7.9×108 cm2·s-1 for oxide and is 4.8 ×108 cm2·s-1 for reductive poly(ferulic acid).The ferulic acid modified electrode shows electrocatalytic activity for oxidation of NADH in 0.1 mol·dm-3 phosphate buffer solution.The peak currents were proportional to the concentrations of NADH in the range of 0.01～5.0 mmol·dm-3.

关 键 词：聚阿魏酸 修饰电极 电化学特性 电催化性能 烟酰胺腺嘌呤二核苷酸 聚合物膜 玻碳电极 电聚合 

分 类 号：O646.5[理学—物理化学]