真空紫外铝+氟化镁膜偏振特性的研究  

Polarization Characteristic of Al+MgF_2 Film at VUV

作　　者：刘颖[1] 李志刚[2] 李福田[1] 

机构地区：[1]中科院长春光机所应用光学国家重点实验室,吉林长春130022 [2]南开大学物理学院光子学中心,天津300071

出　　处：《光谱学与光谱分析》2002年第5期724-727,共4页Spectroscopy and Spectral Analysis

摘　　要：研究了铝 +氟化镁膜在真空紫外波段的偏振特性。理论上数值模拟计算了铝 +氟化镁膜在真空紫外波段的反射率及其与入射平面平行和垂直两方向的分量 ,分析了铝 +氟化镁膜反射率的两分量随入射条件和氟化镁膜厚度的变化规律 ,在此基础上研究了铝 +氟化镁膜的偏振特性 ,并与单层铝膜的相应特性作了比较。以氟化锂堆作偏振器 ,在Seya Namioka真空紫外反射率计上实验研究了铝 +氟化镁膜的偏振特性。研究结果表明 ,铝 +氟化镁膜的偏振特性由于受到氟化镁厚度的调制 ,存在反射率的垂直分量小于平行分量的情形 ,从而使铝 +氟化镁膜的消光比在非正入射的条件下接近 1。Polarization characteristic of Al + MgF2 is researched theoretically and experimentally. According to the theory of electromagnetism, the reflectance perpendicular and parallel to the incident plane of, Al + WF2 is calculated in the way of matrix optics. The effect of incident conditions and thickness of MgF2 is considered on the reflectance of Al + MgF2 coatings. The MgF2 not only prevents the oxidation of aluminum but also increases the reflectance of Al + MgF2 by interference. The polarization of Al + MgF2 is analyzed using the concept of ratio of extinction based on above mentioned calculations. The polarization character of Al + MgF2 and single Al coating is compared. The reflectances perpendicular and parallel to the incident plane of Al + MgF2 film are measured at VUV range, using LiF polarizer as a VUV polarizer. So the polarization character of Al + MgF2 is researched experimentally. Both theoretical and experimental results of the polarization character of Al + MgF2 are coincident.

关 键 词：铝+氟化镁膜 真空紫外波段 反射 偏振 反射膜 

分 类 号：O484.41[理学—固体物理] O436.3[理学—物理]