氟化氙(C-A)蓝绿激光技术研究进展  

Research on optically pumped XeF(C-A) laser technology

作　　者：于力[1] 刘晶儒[1] 易爱平[1] 张永生[1] 胡志云[1] 马连英[1] 刘文元[1] 李辉[1] 袁孝[1] 曾正中[1] 叶锡生[1] 

机构地区：[1]西北核技术研究所,陕西西安710024

出　　处：《强激光与粒子束》2002年第5期659-663,共5页High Power Laser and Particle Beams

基　　金：国家 8 63激光技术领域资助课题

摘　　要：综述了XeF(C A)激光的产生原理 ,表面放电光泵浦源的结构 ,激光器装置 ,XeF(C A)激光实验研究以及XeF(C A)激光理论模拟 ;介绍了XeF2 浓度的监测 。The kinetics of XeF(C-A) laser were presented. The structures of the surface discharge optically pumping source and the laser devices were introduced. Experimental study and numerical simulation of XeF(C-A) laser, as well as the detection of the density of XeF2 were summarized. The development of the radiative source technology was described. The energy deposition efficiency over 80% has been obtained on a module of impacted sectioned surface discharge source and the average deposit power density is about 27 MW/cm. The framing photographs of discharge plasma channel under different conditions have been obtained. For multi-channel discharge source, the symmetrical synchronous discharge and the photodissociation waves have been obtained.

关 键 词：XEF(C-A)激光 表面放电 光泵浦 解离波 数值模拟 氟化氙蓝绿激光 激光器 

分 类 号：TN248.5[电子电信—物理电子学]