亚微米级超低发射度注入器年度报告  

Annual Report of Sub-micron Ultra-low Emittance Injector

作　　者：谢大弢[1] 朱凤[1] 黄文会[1] Xie Datao;Zhu Feng;Huang Wenhui(Peking University)

机构地区：[1]北京大学

出　　处：《科技资讯》2016年第19期180-181,共2页Science & Technology Information

摘　　要：该报告重点对超导光阴极注入器和常温光阴极微波电子枪两种有发展前景的超低发射度电子源进行研究。该年度完成了超导光阴极注入器的安装和常温光阴极微波电子枪的研制,进一步改进注入器各个子系统的稳定性和精度,针对两种不同类型的光阴极注入器开展了束流实验,得到了稳定的接近m A量级的电子束流和高品质的高峰值流强的电子束流;进行了紫外驱动激光的性能优化研究;在高平均流强超导注入器的驱动激光上发展了调光技术,便于强流电子束的束流测量与分析研究;研制了亚皮秒同步控制系统,进行了在线测试实验。Researches are carried out on two types of ultra-low emittance electron sources, superconducting photoinjector and normal conducting photocathode RF gun. Progresses are obtained in this year. Installation of superconducting photoinjector and the fabrication of normal conducting photocathode RF gun are finished. The instability and precision of sub-system are further updated. Beam loading experiments on the two injectors are carried out. Close to mA class and high peak current electron beams are obtained and stable. UV laser system is optimized. Laser adjusting technology is developed on high current superconducting injector, which is helpful to measurement and analysis of high current electron beam. Sub pico-second LLRF system is developed and the online experiments are carried out.

关 键 词：注入器 电子枪 发射度 

分 类 号：TL503.3[核科学技术—核技术及应用]