直流溅射法制备SnO_2纳米颗粒的机理及工艺研究  

Process and mechanism of SnO_2 nanoparticles prepared by DC sputtering

作　　者：刘敬茹[1] 宋西平[1] 王涵[1] 陈嘉君[1] 张蓓[2] LIU Jingru;SONG Xiping;WANG Han;CHEN Jiajun;ZHANG Bei(State Key Laboratory for Advanced Metals and Materials, University of Science and Technology Beijing, Beijing 100083, China;Center of Fundamental Natural Science Experiment, University of Science and Technology Beijing,Beijing 100083, China)

机构地区：[1]北京科技大学新金属材料国家重点实验室,北京100083 [2]北京科技大学自然科学基础实验中心,北京100083

出　　处：《电子元件与材料》2017年第1期57-61,共5页Electronic Components And Materials

基　　金：国家自然科学基金资助(No.21171018);国家自然科学基金资助(No.51271021);北京市自然科学基金资助(No.2162025)

摘　　要：采用直流溅射法成功制备出了SnO_2纳米颗粒,分析了SnO_2纳米颗粒的形成机理,研究了不同溅射时间、不同衬底材质对SnO_2纳米颗粒形成的影响规律。结果表明,溅射时间对SnO_2纳米颗粒的尺寸有显著影响。随溅射时间延长,颗粒尺寸呈线性增长,从约20 nm(1 min)增长到约80 nm(10 min)。衬底材质则对SnO_2纳米颗粒的形态及分布有显著影响。对比单晶硅、载玻片、喷金载玻片三种不同衬底材质,发现以单晶硅为衬底的纳米颗粒分布均匀,而以载玻片为衬底的纳米颗粒分布不均,并且随溅射时间延长,以载玻片为衬底的纳米颗粒发生团聚生长,颗粒粗大。载玻片衬底喷金处理后可使纳米颗粒的形貌及分布得到改善。SnO2 nanoparticles were prepared by using DC sputtering. The formation mechanism of SnO2 nanoparticles was analyzed and the effects of substrate materials and sputtering time on SnO2 nanoparticles were investigated. The results show that the sputtering time has a significant effect on the size of SnO2 nanoparticles. The particle size increases linearly with the sputtering time, grown from about 20 nm (1 min) to about 80 nm (10 min). Substrate materials mainly affect the morphology and distribution of SnO2 nanoparticles. Compared with monocrystalline silicon, microslide and Au-sprayed microslide three kinds of substrate materials, it is found that nanoparticles have a uniform distribution on monocrystallinesilicon, but a nonuniform distribution on microslide. With the increasing of sputtering time, nanoparticles on microslide would cluster and become coarse. In the case of Au-sprayed microslide, the morphology and distribution of nanoparticles can be obviously improved.

关 键 词：SNO2 纳米颗粒 直流溅射 制备工艺 机理研究 衬底 

分 类 号：TN304.2[电子电信—物理电子学]