阴极等离子体电沉积陶瓷涂层的研究现状  

Current status of research on cathodic plasma electrolytic deposition of ceramic coatings

作　　者：邓舜杰 蒋驰[2] 刘天伟[2] 帅茂兵[1] DENG Shun-jie;JIANG Chi;LIU Tian-wei;SHUAI Mao-bing(Science and Technology on Surface Physics and Chemistry Laboratory, Mianyang 621907,China)

机构地区：[1]表面物理与化学重点实验室,四川绵阳621907 [2]中国工程物理研究院,四川绵阳621900

出　　处：《电镀与涂饰》2018年第3期147-154,共8页Electroplating & Finishing

基　　金：国家自然科学基金面上项目(51573172);中国博士后科学基金(2017M623066)

摘　　要：介绍了阴极等离子体电沉积陶瓷涂层的基本原理及其在不同领域中的应用,总结了影响阴极等离子体电沉积陶瓷涂层的因素(包括电压、电流密度、占空比、脉冲频率、主盐浓度、电解液pH、添加剂和实验装置),阐述了阴极等离子体电沉积技术目前存在的问题,展望了其应用前景。The main mechanism of cathodic plasma electrolytic deposition(CPED)and its applications in different fields were introduced.Some influence factors(including voltage,current density,duty cycle,pulse frequency,main salt concentration,electrolyte pH,additives,and experimental equipment)were summarized.The existing problems of CPED and its future application were discussed.

关 键 词：阴极等离子体电沉积 氧化物陶瓷涂层 耐高温氧化性 耐磨性 耐蚀性 影响因素 综述 

分 类 号：TG174.44[金属学及工艺—金属表面处理]