浸渍提拉法制备改性氧化石墨烯光催化薄膜及其性能表征  

Preparation of photocatalytic modified graphene oxide thin film by dip coating and its characterization

作　　者：顾皓辰 郑艳银 刘洋洋 杨培燕 GU Hao-chen;ZHENG Yan-yin;LIU Yang-yang;YANG Pei-yan(High School Affiliated to BIT, Beijing 100089, China)

机构地区：[1]北京理工大学附属中学,北京100089 [2]中国钢研科技集团有限公司先进金属材料涂镀国家工程实验室,北京100081 [3]河北科技大学材料科学与工程学院,河北石家庄050000

出　　处：《电镀与涂饰》2018年第4期178-183,共6页Electroplating & Finishing

摘　　要：采用浸渍提拉法在玻璃基底上制备改性氧化石墨烯(GO)薄膜,研究了工艺条件对改性GO薄膜附着力的影响,通过扫描电镜和拉曼光谱对改性GO薄膜的微观形貌和结构进行表征,测试了可见光下改性GO薄膜对COD(化学需氧量)为54.35 mg/L的城市污水的降解性能。结果发现,在GO质量浓度为1.0 mg/mL,提拉(浸渍)速率为120 mm/min,镀膜间隔为12 s,镀膜次数为5次的条件下制得的改性GO薄膜具有最佳的附着力。改性GO薄膜具有良好的稳定性和可见光催化性能,24 h的COD去除率可以达到70.6%,经15次重复使用后的COD去除率依然达到63.4%。A modified graphene oxide(GO)thin film was formed on the glass substrate by dip coating method.The effects of process conditions on the adhesion strength of the thin film were studied.The microscopic morphology and structure of the modified GO film were characterized by scanning electron microscopy and Raman spectroscopy.The performance of the modified GO film on the photodegradation of a sewage containing54.35mg/L COD(chemical oxygen demand)under visible light was tested.The results showed that the modified GO film prepared by repeatedly dipping into a solution containing1mg/mL GO at a constant rate of120mm/min and pulling up at the same rate after an interval of12s for5times has the optimal adhesion strength.The modified GO film has good stability and photocatalytic property in that the COD removal rate reached70.6%within24h and still maintained as high as63.4%after15times of repeated use.

关 键 词：氧化石墨烯 薄膜 浸渍提拉法 污水 可见光 光催化降解 化学需氧量 

分 类 号：TB34[一般工业技术—材料科学与工程]