激光诱导化学反应刻蚀石英玻璃的实验研究  

Study on quartz glass etched by laser induced chemical reaction

作　　者：丛启东 袁根福 章辰 郭百澄 CONG Qi-dong;YUAN Gen-fu;ZHANG Chen;GUO Bai-cheng(School of Mechanical Engineering,Jiangnan University,Wuxi 214122,China)

机构地区：[1]江南大学机械工程学院,江苏无锡214122

出　　处：《激光与红外》2018年第3期291-298,共8页Laser & Infrared

基　　金：国家自然科学基金项目(No.51175229)资助

摘　　要：针对目前常用的超短脉冲激光加工、激光诱导等离子加工、纳秒紫外激光加工石英玻璃刻蚀率低下的问题,提出一种能够大范围、高刻蚀率、低裂损刻蚀石英玻璃的新方法,即利用1064nm红外激光诱导Ba(OH)_2化学反应刻蚀。本文主要从不同能量密度激光诱导化学反应刻蚀机理进行分析,实验表明,当激光能量密度超过16 J/cm^2时,石英玻璃被刻蚀;当激光能量密度在16~24 J/cm^2之间时,仅物理作用去蚀石英玻璃,故刻蚀率随激光能量变化较小;当激光能量密度在24~42 J/cm^2之间时,刻蚀率随激光能量密度变化较大,该阶段Ba(OH)_2以及其分解生成的Ba O在高温条件下都与石英玻璃主要成分SiO_2发生化学反应并生成Ba SiO_3,故刻蚀率较高;激光能量密度在42~46 J/cm^2时,化学反应速率趋于饱和,故该阶段刻蚀率随激光能量密度变化较小。As the common laser processing methods such as ultrashort pulse laser processing,laser induced plasma processing,nanosecond ultraviolet laser processing have low corrosion rate for quartz g la ss,a new etching method for quartz glass is proposed,and it has the characteristics of wide range,high corrosion rate and low fracture.The etching mechanism of laser induced chemical reaction with different energy densities was analyzed.The experiment shows that the quartz glass can be etched when the laser energy density is more than16J/c m2.When the laser energy density is between16~24J/cm2,quartz glass is corroded by the only physical mechanism,thus,the change of etching rate is low with the change of laser energy density.When the laser energy density is between24~42J/cm2,the change of etching rate with the increasing of laser energy density is comparatively large.The main reason is that the chemical reaction of Si02with both B a(OH)2and BaO are generated at high temperature and BaSiO3is produced.When the laser density is between41?46J/c m2,the rate of chemical reaction is nearly maximum,so the etching rate increases slightly with the increase of laser energy density.

关 键 词：激光技术 石英玻璃刻蚀 化学作用机理 刻蚀率 

分 类 号：TN249[电子电信—物理电子学]