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作 者:Xu Wang Yan-Wen Zhang Dong Han Yun-Biao Zhao Zi-Qiang Zhao Ming Zhang
机构地区:[1]Institute of Materials, China Academy of Engineering Physics [2]Department of Nuclear Physics, China Institute of Atomic Energy [3]State Key Laboratory of Nuclear Physics and Technology,Institute of Heavy Ion Physics, School of Physics, Peking University
出 处:《Nuclear Science and Techniques》2018年第4期72-78,共7页核技术(英文)
基 金:supported by the National Natural Science Foundation of China(Grant Nos.11705169,91426304 and 91226202)
摘 要:Cross-sectional investigation is an important method to study ion irradiation effects in the depth direction. In this study, 2 Me V H^+was implanted in 6 H-SiC single crystals to investigate the effects of light ion irradiation on SiC. Raman spectroscopy and scanning electronic microscopy(SEM) were carried out on crosssectional samples to reveal the in-depth damage states and dopant behavior. The most damaged region is a little shallower than that predicted by the SRIM procedure,owing to the uncertainty in SRIM simulations. Layered structures representing zones of varying damage after2 MeV H ion irradiation are clearly observed. Two bands are observed in SEM images, of which on band corresponds to the damage peak, while the other band at the end of the H ion-affected area is probably a result of H diffusion propelled by a hydrogen-rich layer during irradiation.A charge accumulation effect related with conductivity on the sample surfaces during SEM tests is observed in theH-implanted area. A model is proposed to explain these phenomena.Cross-sectional investigation is an important method to study ion irradiation effects in the depth direction. In this study, 2 Me V H^+was implanted in 6 H-SiC single crystals to investigate the effects of light ion irradiation on SiC. Raman spectroscopy and scanning electronic microscopy(SEM) were carried out on crosssectional samples to reveal the in-depth damage states and dopant behavior. The most damaged region is a little shallower than that predicted by the SRIM procedure,owing to the uncertainty in SRIM simulations. Layered structures representing zones of varying damage after2 MeV H ion irradiation are clearly observed. Two bands are observed in SEM images, of which on band corresponds to the damage peak, while the other band at the end of the H ion-affected area is probably a result of H diffusion propelled by a hydrogen-rich layer during irradiation.A charge accumulation effect related with conductivity on the sample surfaces during SEM tests is observed in theH-implanted area. A model is proposed to explain these phenomena.
关 键 词:SiC PROTON IRRADIATION CROSS-SECTIONAL analysis RAMAN spectroscopy SEM
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