利用球-旋转椭球模型研究上皮组织散射特性  被引量:1

Scattering characteristics of epithelial tissues by sphere-rotation ellipsoid model

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作  者:李华贵 李艳秋 郑猛 Li Huagui;Li Yanqiu;Zheng Meng(Key Laboratory of Photoelectronic Imaging Technology and System,Ministry of Education of China,School of Optoelectronics,Beijing Institute of Technology,Beijing 100081,China)

机构地区:[1]北京理工大学光电学院光电成像技术与系统教育部重点实验室,北京100081

出  处:《红外与激光工程》2018年第2期245-249,共5页Infrared and Laser Engineering

基  金:国家自然科学基金重大科研仪器研制项目(11627808)

摘  要:组织模型在组织成像机理及光学疾病诊断技术的研究和改进中发挥着重要作用。然而上皮组织细胞中不仅包含球形散射体,往往还包含椭球形散射体。目前对包含椭球散射体的上皮组织模型的研究还鲜有报道。建立了上皮组织的球-旋转椭球散射模型,利用Monte Carlo算法仿真分析了模型参数的变化对前向散射光强分布及穆勒矩阵极分解参量的影响。结果表明,旋转椭球散射系数、体积和长短轴比的增大均会导致组织模型的去偏作用增强,其中散射系数对去偏的影响最显著;各向异性分布的旋转椭球具有相位延迟作用,且相位延迟随椭球散射系数及长短轴比的增大而增大,随椭球体积的增大而减小。该研究对早期癌变诊断技术的研究具有一定指导意义。Tissue models play an important role in the study of the imaging mechanism of biological tissues and in the research and improvement of optical disease diagnosis technology.However,there are not only spherical scatterers in epithelial cells,but also ellipsoidal scatterers generally.In this paper,there are few studies of epithelial tissue models containing ellipsoidal scatterers so far.Sphere-rotation ellipsoid scattering model was established,and the effect of model parameters on forward scattering intensity distributions and Mueller matrix polar decomposition parameters were analyzed by Monte Carlo simulation method.The results show that the increase of scattering coefficient,the increase of volume and axial ratio of rotation ellipsoids all would lead to a higher depolarization power.Moreover,the influence of scattering coefficient of rotation ellipsoids on depolarization is most significant.The ellipsoidal scatterers with an anisotropic distribution contribute to retardance,which has positive correction with the scattering coefficient and axial ratio of ellipsoids and negative correction with the volume of ellipsoids.This study can give some clues to the development of precancer diagnosis technology.

关 键 词:组织模型 光散射 穆勒矩阵 MONTECARLO 

分 类 号:O436.2[机械工程—光学工程]

 

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