WO_3薄膜的磁控溅射法制备及电致变色性能  

Electrochromic Performance Study of WO_3 Thin Films Prepared by Magnetron Sputtering

作　　者：金良茂[1] 汤永康[1] 甘治平[1] 李刚[1] 金克武 杨勇[1] 彭塞奥 王天齐 JIN Liangmao;TANG Yongkang;GAN Zhiping;LI Gang;JIN Kewu;YANG Yong;PENG Saiao;WANG Tianqi(State Key Laboratory of Advanced Technology for Float Glass,Bengbu Design&Research Institute for Glass Industry,Bengbu 233000)

机构地区：[1]蚌埠玻璃工业设计研究院浮法玻璃新技术国家重点实验室,蚌埠233000

出　　处：《材料导报》2017年第A02期140-144,共5页Materials Reports

基　　金：安徽省重点研究与开发计划项目(1704a0902010;1704a0902014);安徽省科技重大专项项目

摘　　要：采用直流反应磁控溅射制备了具有优异电致变色性能的WO3薄膜。通过对成膜参数的调控,实现了低功率和短溅射时间的制膜制度,获得了较宽的工艺范围。通过X射线衍射仪、场发射扫描电子显微镜、光学轮廓仪、电化学工作站、紫外-可见-红外分光光度计研究了薄膜的物相、微观结构、厚度、电致变色性能。研究表明:在溅射功率为50 W,溅射压强为2.0 Pa,反应气体流量为20 sccm时所制得的薄膜性能最为优越。所制备薄膜具有较短的变色响应时间和大幅度的变色调制幅度,其对可见光变色调制幅度达到80%。WO3 thin films with excellent electrochromic performance have been prepared by DC magnetron reaction sputtering method.Wide scope of preparation conditions with low sputtering power and short deposition time have been obtained by controlling the deposition parameters.The phase,microstructure,film thickness and electrochromic performance of WO3 films were investigated by X-ray diffraction(XRD),field emission scanning electron microscopy(FESEM),optical profiler,electrochemical workstation and UV-visible-infrared spectrophotometer,respectively.The results show that the films with best properties are achieved when the oxygen flow rate,sputtering power and pressure are 50 W,2.0 Pa and 20 sccm,respectively.The films also have very short response time and a wide range of optical modulation amplitude,and the optical modulation amplitude may reach 80%for entire visible light region.

关 键 词：WO3薄膜 电致变色 磁控溅射 

分 类 号：TB34[一般工业技术—材料科学与工程] TB381