浸渍炭中铜氧化物的XPS研究  被引量:6

XPS Study on Copper Oxide in Impregnated Carbon

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作  者:胡玉良 刘国宏 周晓东 韩万飞 温维丽 王娜 HU Yu-liang;LIU Guo-hong;ZHOU Xiao-dong;HAN Wan-fei;WEN Wei-li;WANG Na(Biological and Chemical Department,Institute of NBC Defense,Beijing 102205;Shanxi Xihua Chemical Co.,Ltd.,Shanxi Taiyuan 030008,China)

机构地区:[1]陆军防化学院,北京102205 [2]山西新华化工有限责任公司,山西太原030008

出  处:《广州化工》2018年第7期73-76,共4页GuangZhou Chemical Industry

摘  要:通过制备单一组分的铜浸渍炭(Cu-AC),应用X射线光电子能谱(XPS)分析技术研究浸渍炭中铜氧化物的化学态及其随深度的变化。结果表明:浸渍炭表面的Cu主要以CuO化学态存在,内部主要以Cu_2O化学态存在;浸渍炭防护HCN的反应在其表面和内部同时发生,而对ClCN的防毒作用主要在浸渍炭的表面进行。本研究为调控浸渍炭的制备工艺和生产条件提供参考,进一步提高防护性能、保证产品质量稳定。The chemical state and variation with depth of copper oxide in impregnated carbon were studied by X-ray photoelectron spectroscopy(XPS)analysis through preparing a copper-impregnated carbon(Cu-AC)with single component.The results showed that Cu was mainly presented in the chemical state of CuO on the surface of impregnated carbon and in the chemical state of Cu 2 O inside.The reaction of HCN with impregnated carbon occurs on the surface and the inside at the same time.The reaction of ClCN with impregnated carbon occurs on the surface.This study provided a reference for regulating the preparation process and production conditions of impregnated carbon,and further improved the protection performance and ensures the product quality stable.

关 键 词:浸渍炭 X射线光电子能谱 铜氧化物 深度剖析 氢氰酸 氯化氰 

分 类 号:O69[理学—化学]

 

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