氧化石墨烯/二氧化硅纳米复合材料的等离子体法制备及其结构研究  

Preparation of graphene oxide/silica nanocomposites by atmospheric sliding-arc plasma and the study of its structure

作　　者：杨屹 程旺 尹波[1] 杨鸣波[1] YANG Yi;CHENG Wang;YIN Bo;YANG Ming-bo(College of Polymer Science and Engineering,State Key Laboratory of Polymer Materials Engineering,Sichuan University,Chengdu 610065,China)

机构地区：[1]四川大学高分子科学与工程学院,高分子材料工程国家重点实验室,四川成都610065

出　　处：《化学研究与应用》2018年第4期583-587,共5页Chemical Research and Application

摘　　要：本文通过大气压滑动弧等离子体高效修饰改性了氧化石墨烯(GO),制备GO/SiO_2纳米复合材料。GO/SiO_2的整体形态及SiO_2沉积物中的颗粒粒径与分布可分别通过反应物中正硅酸乙酯(TEOS)的使用量以及等离子体放电功率进行控制。于0.03mg TEOS/1mg GO,输入电压为290v的条件下,制备得到了SiO_2颗粒(约119nm)呈阵列规整排布于GO表面的GO/SiO_2样品。由于该处理方法具有连续处理的特点,所以在纳米粒子改性效率上相对于传统表面化学改性有很大的提高。除了本文提到的GO粒子以及TEOS前驱体,该方法也适用于其他纳米粒子,且能在其表面实现包括有机、无机等多种表面修饰结构的制备。In this paper,a efficient method of atmospheric sliding-arc plasma was used for modificationof graphene oxide(GO),and GO/SiO 2nanocomposites were prepared.The morphology of GO/SiO 2 could be controlled by the usage of TEOS in the reactants,while theparticle size and distribution of SiO 2 sediments could be regulated by the discharge power of plasma.Under the condition of 0.03mg TEOS/1mg GO and the input voltage of 290v,the GO/SiO2 samples with SiO 2 particles(about 119nm)arranged regularly on the GO surface were prepared.Because the method had the characteristics of continuous processing,it had greatly improved the efficiency of nanoparticles modification compared with the traditional surface chemical modification.In addition to GO and TEOS(precursor)mentioned in the paper,this method was also suitable for other nanoparticles,and could achieve the preparation of various surface modification structures,including organic and inorganic.

关 键 词：大气压滑动弧等离子体 纳米粒子改性 连续处理 氧化石墨烯 

分 类 号：O624.12[理学—有机化学]