皮秒激光抛光KDP晶体的工艺研究  

Process study on KDP crystal polished by picosecond laser

作　　者：韩小花 邓磊敏 吴宝业 白克强 周翔 刘朋 段军[1] HAN Xiaohua;DENG Leimin;WU Baoye;BAI Keqiang;ZHOU Xiang;LIU Peng;DUAN Jun(Wuhan National Laboratory for Optoelectronics,Huazhong University of Science and Technology,Wuhan 430074,China;Department of Electrical and Computer Engineering,University of Nebraska,Lincoln NE 68588,USA)

机构地区：[1]华中科技大学武汉光电国家实验室,武汉430074 [2]内布拉斯加大学电气和计算机工程系,林肯ne68588

出　　处：《激光技术》2018年第2期166-171,共6页Laser Technology

基　　金：国家自然科学基金资助项目(51475182;51675205)

摘　　要：为了改变KDP晶体精密加工难和效率低的状态,采用皮秒超快激光抛光KDP晶体的新方法,系统地研究了激光波长、单脉冲能量密度、激光束入射角、光斑搭接率、扫描方式以及激光焦深等因素对激光抛光KDP晶体质量的影响规律,并对激光与KDP晶体的相互作用机理进行了分析。结果表明,在皮秒激光波长λ=355nm、聚焦镜焦距f=56mm、激光束入射角α=84°、激光重复频率F=800k Hz、脉冲能量密度Q=2.4J/cm^2、光斑搭接率O=60%、45°多方向交叉扫描以及加工次数T=10次的优化参量条件下,KDP晶体表面粗糙度均方根值可达到76nm。这一结果使激光抛光技术的研究得到了进一步补充。In order to improve the difficulty and low efficiency of precision machining of KDP crystal,picosecond ultrafast laser was used in KDP crystal polishing.The influence of the factors of laser wavelength,pulse energy density,laser beam incident angle,overlapping rate,scan mode and laser focal depth on laser polishing quality of KDP crystal was studied.The interaction mechanism of laser and KDP crystal was analyzed.The experimental results show that,with the optimal parameters,such as,picosecond laser wavelengthλof 355nm,focal length f of 56mm,laser beam incident angleαof 84°,laser repetition frequency F of 800kHz,pulse energy density Q of 2.4J/cm 2,overlapping rate O of 60%,45°multi direction cross scanning and processing times T of 10,root mean square of surface roughness of KDP crystal can reach 76nm.The results add the supplements for the research of laser polishing technology.

关 键 词：激光技术 激光抛光 工艺研究 KDP晶体 表面粗糙度 

分 类 号：O786[理学—晶体学]