纯镁在HFC-152a/CO2气氛中的成膜特征  

Pure Magnesium Deposition Characteristics in HFC-152a/CO2 Atmosphere

作　　者：曾一文[1] 邓文秀 毛献萍[1] 万茂生[1] Yiwen Zeng;Wenxiu Deng;Xianping Mao;Maosheng Wan(Hezhou College,Hezhou Guangxi 542899,China)

机构地区：[1]贺州学院,广西贺州542899

出　　处：《材料科学研究（中英文版）》2015年第4期77-80,共4页Research of Materials Science

基　　金：广西自然科学基金资助项目(项目编号:2014GXNSFAA118345)广西高校科学技术研究项目(项目编号:2013ZD068)。

摘　　要：研究了熔态Mg在HFC-152a/CO2保护气氛中形成的表面氧化膜特征。氧化膜呈致密特征,主要由Mg、F、O、C四种元素组成,随着HFC-152a浓度的增加,表面膜中F原子分数逐渐增加,而O原子分数逐渐减少。XRD和XPS分析显示表面氧化膜主要由MgF2、MgO和C组成。The present paper studies the characterization of surface films of magnesium melt protected by HFC-152a/CO2 gases.The oxide film characterizes with densification and consists of four kinds of chemical elements,including F,Mg,O,and C.With the increasing concentration of HFC-152a,the atom fraction of F increases gradually,while that of O gradually decreases in the surface films.The analysis of XRD and XPS shows that the surface oxide film is mainly composed of MgF2,MgO and C.

关 键 词：保护气氛 HFC-152A 表面膜 

分 类 号：TQ343.6[化学工程—化纤工业]