席夫碱自组装膜对铜的缓蚀性能研究  

Research on corrosion inhibition of Schiff bases self-assembled monolayers on copper

作　　者：苏红玉[1] 刘琳[1] 张强[1,2] 钱建华 SU Hong-yu;LIU Lin;ZHANG Qiang;QIAN Jian-hua(Provincial Key Laboratory for Synthesis and Application of the Functional Compounds,Bohai University, Jinzhou 121013,China;State Key Laboratory of Molecular Reaction Dynamics,Dalian Institute of Chemical Physics,Chinese Academy of Science,Dalian 116023,China)

机构地区：[1]辽宁省功能化合物的合成与应用重点实验室,渤海大学,辽宁锦州121013 [2]分子反应动力学国家重点实验室,中国科学研究院大连物理化学研究所,辽宁大连116023

出　　处：《化学研究与应用》2018年第8期1293-1297,共5页Chemical Research and Application

基　　金：辽宁省教育厅第三批特聘教授支持计划资助(2014-323);辽宁省创新团队项目资助(LT2015001);国家自然科学基金资助项目(21606023)。

摘　　要：采用分子自组装技术在铜表面制备2-氨基-5-巯基-1,3,4-噻二唑缩4-甲酰苯甲酸(A)缓蚀膜。通过电化学测试技术研究了该席夫碱膜在3wt.%Na Cl溶液中对金属铜的缓蚀性能。结果表明,自组装分子膜能有效抑制铜片的腐蚀,当浓度为15 mmol·L-1,组装时间为6 h时缓蚀效果最佳,高达97.11%。量化计算和分子动力学模拟得到了缓蚀剂分子的活性位点和在Cu(111)面的吸附形态。缓蚀剂的缓蚀效率的理论评价与电化学测试结果相一致。Self-assembled monolayer of 2-Amino-5-mercapto-1,3,4-thiadiazole-4-Formylbenzoic acid is fabricated on copper surface by molecular self-assembled process.The corrosion inhibition performance of the Schiff A SAMs in 3wt.%NaCl solution is examined by electrochemical methods.The results indicated that the corrosion inhibition ability is obvious increase compared with bare copper.The film assembled at 15 mmol·L-1 concentration for 6 h possessed the best inhibition efficiency,which was up to 97.11%.The active site of molecular was calculated by theoretical calculations and the molecular adsorption behavior at the Cu(111)was studied by molecular dynamics simulation.The inhibition performance evaluated by the theoretical method was consistent with the Tafel polarization curves results.

关 键 词：席夫碱 自组装膜 缓蚀性能 分子动力学模拟 

分 类 号：O646.6[理学—物理化学]