响应面法优化电解锰渣的微波活化有效硅工艺条件  

Optimization of Microwave Activated Effective Silicon Process Conditions for Electrolytic Manganese Residue by Response Surface Methodology

作　　者：彭秋菊 李佳 杜冬云 叶恒朋 PENG Qiu-ju;LI Jia;DU Dong-yun;YE Heng-peng(College of Resources and Environment Science,South-Central University for Nationalities,Wuhan 430074,China)

机构地区：[1]中南民族大学资源与环境学院,武汉430074

出　　处：《硅酸盐通报》2018年第8期2548-2554,共7页Bulletin of the Chinese Ceramic Society

基　　金：国家科技支撑计划项目(2015BAB01B03);中央高校专项项目(CZD18010;CZY18050)

摘　　要：采用单因素实验和响应面实验方法,对微波焙烧提高电解锰渣(EMR)中有效硅含量的活化条件进行优化研究。首先采用单因素法研究了焙烧温度、焙烧时间、微波功率和助剂比例(Na_2CO_3与EMR的质量比)对EMR中有效硅含量的影响,然后利用响应面法探讨了各因素及其交互作用对EMR中有效硅含量的影响,确定了微波焙烧提升EMR中有效硅含量的最佳工艺条件为:焙烧温度854℃,焙烧时间43 min,微波功率2608 W,助剂比例0.55。在该工艺条件下,有效硅含量可达18.16%,试验值与模型预测值的误差只有0.11%。采用回归分析法,通过实验验证了响应面优化得到的二次多项式模型是合理可靠的。同时,硅的微波活化工艺为电解锰渣的资源化利用提供新思路。The method of single experiment and response surface experiment were chosen to optimize the activation conditions of effective silicon content in electrolytic manganese residue(EMR)by microwave roasting.First,the effects of calcination temperature,calcination time,microwave power and ratio of additives(the mass ratio of Na2C03/EMR)on the content of available silicon in EMR are studied through single factor method,then the interaction effects on the effective silicon content in EMR are discussed by response surface methodology.The optimum conditions of improving the effective silicon content in EMR by microwave roasting are determined:roasting temperature 854℃,roasting time 43 min,microwave power 2608 W,and the proportion of ratio 0.55.The effective silicon content reaches 18.16%under the optimum processing conditions,the error value between the experimental and the predicted value is only 0.11%.The regression analysis method is used to indicate that the quadratic polynomial model deduced from the response surface methodology is reasonable.Meanwhile,the microwave activation technology of silicon provides a new ideas for the resource utilization of electrolytic manganese residue.

关 键 词：电解锰渣 微波焙烧 有效硅 响应面法 

分 类 号：TQ173[化学工程—搪瓷工业]