高性能三波长增透介质膜系研制  

Research on the High-Quality Three Wavelength Anti-reflective Dielectric Thin Film

作　　者：邱服民[1] 卢忠文 浦云体 乔曌[1] QIU Fuming;LU Zhongwen;PU Yunti;QIAO Zhao(Chengdu Fine Optical Engineering Research Center,Chengdu 610041,China)

机构地区：[1]成都精密光学工程研究中心,成都610041

出　　处：《光散射学报》2018年第3期271-276,共6页The Journal of Light Scattering

摘　　要：本文系统分析了传统单波长增透膜系的缺点,以镀膜材料在紫外、可见和近红外区域折射率数据为基础,通过研究膜系设计理论,优化设计了合适的膜系;通过制造修正挡板,以及优化离子源辅助沉积工艺,找到了能同时满足三波长增透的镀膜工艺,研制的三波长增透介质膜在1053nm和527nm处剩余反射小于0.5%,在351nm处剩余反射小于0.2%,且在空气中放置20天后,膜层温漂很小。The disadvantages of traditional single-wavelength anti-reflective(AR)coating design are analyzed.Based on the reflectivity index data of coating material in the ultraviolet,visible and near-infrared regions,the proper multilayer coating design is obtained.By manufacturing the offset shutter and optimizing the process parameters in ion-assisted deposition,the optimized technology of three wavelength anti-reflective coating is found and the three wavelength anti-reflective coating spectral shift caused by temperature is small after one month in air.The reflective index in 1053 nm and 527 nm is below 0.5%.and the reflective index in 351 nm is below 0.2%.

关 键 词：薄膜 三波长增透 膜系设计 离子源辅助 

分 类 号：O484.2[理学—固体物理]