预处理和溅射工艺参数对锆合金表面TiN涂层膜/基结合强度的影响  

Influence of Pretreatment and Sputtering Parameter on Film/Base Bond Strength of TiN Coating on Zirconium Alloy Surface

作　　者：曹殿鹏 邹树梁[1] 肖魏魏 唐德文[1] 雷明 CAO Dianpeng;ZOU Shuliang;XIAO Weiwei;TANG Dewen;LEI Ming(Hunan Provincial Key Laboratory of Emergency Safety Technology and Equipment for Nuclear Facilities,University of South China,Hengyang 421001,China;China National Nuclear Corporation,Beijing 100822,China;CNNC Jianzhong Nuclear Fuel Company,Yibin 644000,China)

机构地区：[1]南华大学核设施应急安全技术与装备湖南省重点实验室,湖南衡阳421001 [2]中国核工业集团有限公司,北京100822 [3]中核建中核燃料元件有限公司,四川宜宾644000

出　　处：《原子能科学技术》2018年第11期2095-2100,共6页Atomic Energy Science and Technology

摘　　要：为获得高结合强度锆合金表面涂层的制备技术,采用磁控溅射法制备了TiN涂层、划痕法测试了膜/基结合强度,研究了基体预处理表面粗糙度、溅射功率、基体加热温度和基体偏压对锆合金表面TiN涂层膜/基结合强度的影响。实验制备的TiN涂层厚度在5~15μm范围内、基体预处理表面粗糙度在(0.20±0.03)μm范围内时,溅射功率为500W及基体加热至300℃时涂层均有较好的结合强度。基体偏压为-100V时涂层在所讨论的4种基体偏压中具有最好的结合强度。结果表明,溅射工艺参数对涂层膜/基结合强度有显著影响,其中影响显著性从大到小依次为基体加热温度、基体偏压、溅射功率、基体预处理表面粗糙度。In order to obtain the preparation technology of high bond strength zirconium alloy surface coating,the influence of surface roughness,sputtering power,substrate temperature and bias on the film/base bond strength of TiN coating on the surface of zirconium alloy was investigated by magnetron sputtering to prepare TiN coating and by scratch method to test the film/base bond strength.It is found that when the thickness of the TiN coating is within the range of 5-15μm and the surface roughness is(0.20±0.03)μm,the sputtering power is 500 W,and the substrate temperature is 300℃,the coating has the better bond strength.While the coating prepared by substrate bias of-100 V has the best bond strength among the four kinds of substrate biases discussed.The results show that the sputtering process parameters have a significant influence on the film/base bond strength of the coating.Among those parameters,substrate temperature has the most significant effect,the second is the substrate bias,the third is the sputtering power,and the minimum is the surface roughness of the substrate.

关 键 词：锆合金 TIN涂层 结合强度 工艺参数 划痕法 

分 类 号：TL339[核科学技术—核技术及应用]