水稻高温敏感侧根缺失突变体k209的鉴定和基因定位  被引量:2

Identification and Gene Mapping of Rice Lateral Rootless Mutant k209 with High Temperature Sensitivity

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作  者:林静霞 王毅哲 梁人尹 刘烨 丁沃娜[2] 朱世华[2] 郑文娟[2] LIN Jingxia;WANG Yizhe;LIANG Renyin;LIU Ye;DING Wona;ZHU Shihua;ZHENG Wenjuan(School of Marine Science,Ningbo University,Ningbo,Zhejiang 315211,China;College of Science and Technology,Ningbo University,Ningbo,Zhejiang 315212,China)

机构地区:[1]宁波大学海洋学院,浙江宁波315211 [2]宁波大学科学技术学院,浙江宁波315212

出  处:《西北植物学报》2018年第10期1787-1793,共7页Acta Botanica Boreali-Occidentalia Sinica

基  金:浙江省自然科学基金(LQ16C020001);宁波市自然科学基金(2017A610292)

摘  要:该研究以甲基磺酸乙酯(EMS)诱变得到的1个水稻高温敏感侧根缺失突变体k209及其野生型Kasalath为材料,在常温(白天32℃/夜晚22℃)和高温(34℃恒温)培养条件下,对其7d龄幼苗进行表型比较鉴定,并采用亚甲基蓝染色观察侧根原基形成;以突变体k209为母本,分别与野生型Kasalath和粳稻品种日本晴杂交构建2个F2群体进行遗传分析和基因定位,确定基因所属染色体以及在该染色体上的位置。结果表明:(1)在正常温度培养下,突变体k209的7d龄幼苗株高、主根长和不定根长均与野生型Kasalath相似,但侧根长度变短,数量也减少;在高温条件下,k209幼苗株高变矮,主根和不定根的长度变短,表现出无侧根表型。(2)亚甲基蓝染色发现,野生型和k209幼苗主根在正常温度和高温条件下均可以观察到侧根原基,但在高温下k209的侧根原基数目明显少于Kasalath,约为Kasalath的58.03%,且不能突破表皮长出侧根。(3)遗传分析表明,k209的突变表型受隐性单基因控制,利用图位克隆技术将K209基因定位于4号染色体的InDel标记7522K和11524K之间,物理距离约4 002kb。该研究结果为K209基因的克隆和解析水稻侧根的发生机制奠定了基础。A rice lateral rootless mutant k 209 with high temperature sensitivity was isolated from an ethylmethane sulfonate(EMS)-mutagenized rice library.After growing under normal(day 32℃/night 22℃)and high(day and night 34℃)temperature for 7 days,phenotype analysis and lateral root primordia examination by methylene blue staining were conducted.The F 2 populations from crossing of k209 with wild type(WT)Kasalath and Nipponbare were used for genetic analysis and gene mapping,respectively.Results showed that under normal temperature there was no significant difference in the plant height,primary root length and adventitious root length between k209 and WT,but the length and number of lateral roots of k209 were decreased.However,under high temperature,k 209 showed significantly shorter shoots,primary roots and adventitious roots and no lateral root.Furthermore,methylene blue staining analysis revealed that normal lateral root primordia could form in the mutant under both normal and high temperature.Under high temperature the number of lateral root of k209 was only 58.03%of the WT,and they could not outgrowth through the epidermis.Genetic analysis showed that the mutant phenotype was controlled by a single pair of recessive nuclear gene.Map-based cloning analysis located the gene to a 4 002 kb region between InDel markers 7522K and 11524K on chromosome 4.This study will help the cloning of this mutant gene as well as further elucidation of the molecular genetic mechanism of lateral root development in rice.

关 键 词:水稻 侧根 高温敏感突变体 基因定位 

分 类 号:Q319.3[生物学—遗传学] Q789

 

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