N_2流量比对复合磁控溅射Zr-B-N薄膜结构和性能的影响  

Influence of Nitrogen Flow on Structure and Performance of the Zr-B-N Films Prepared by Hybrid Magnetron Sputtering Techniques

作　　者：王铁钢[1] 郭玉垚 唐宽瑜 刘艳梅[1] 林伟 姜肃猛[2] WANG Tie-gang;GUO Yu-yao;TANG Kuan-yu;LIU Yan-mei;LIN Wei;JIANG Su-meng(Tianjin Key Laboratory of High Speed Cutting and Precision Manufacturing,Tianjin University of Technology and Education,Tianjin 300222,China;Division of Surface Engineering of Materials,Institute of Metal Research,Chinese Academy of Sciences,Shenyang 110016,China)

机构地区：[1]天津职业技术师范大学天津市高速切削与精密加工重点实验室,天津300222 [2]中国科学院金属研究所材料表面工程研究部,沈阳110016

出　　处：《表面技术》2018年第11期210-217,共8页Surface Technology

基　　金：国家自然科学基金项目(51301181);天津市应用基础与前沿技术研究计划重点项目(15JCZDJC39700);天津市高等学校创新团队培养计划项目(TD13-5096)~~

摘　　要：目的在反应沉积时补充金属离子,增加薄膜中金属氮化物硬质相的数量,优化复合磁控溅射Zr-B-N薄膜的制备工艺,揭示N_2流量比(N_2/(N_2+Ar))对Zr-B-N薄膜结构和性能的影响规律,进一步强化Zr-B-N纳米复合薄膜。方法采用高功率脉冲磁控溅射和脉冲直流磁控溅射复合镀膜技术沉积Zr-B-N薄膜,借助X射线衍射仪、能谱仪、扫描电镜、纳米压痕仪、划痕测试仪和摩擦试验机,研究N_2流量比对Zr-B-N薄膜成分、微观结构、力学性能和摩擦性能的影响。结果Zr-B-N薄膜具有典型的纳米复合结构,即BN非晶层包裹着ZrB_2、Zr_3N_4、Zr_2N、Zr N等纳米晶,所有Zr-B-N薄膜均沿(100)晶面择优生长。随着N_2流量的增加,(100)晶面的衍射峰宽化加剧;薄膜硬度由36.2 GPa下降到21.0 GPa;膜/基结合力逐渐增强,临界载荷从34.8 N增加到55.8 N;摩擦系数逐渐增大。当N_2流量比为42.9%时,摩擦系数相对较低,约为0.48,归因于薄膜内形成了沿(220)晶面生长的ZrN相,从而起到了良好的减摩作用。结论当N_2流量比为42.9%时,Zr-B-N薄膜具有纳米复合结构和良好的各项性能。The work aims to reveal the influence of N2 flow ratio on the structure and properties of Zr-B-N thin films and further strengthen the nano-composite Zr-B-N films by supplementing the metal ions during the reaction deposition,increasing the amount of metal nitride hard phases in the films and optimizing the preparation process of Zr-B-N thin films.Coating technique of high power impulse magnetron sputtering and pulsed direct current magnetron sputtering was adopted to despoit Zr-B-N films.X-ray diffractometer,energy spectrometer,scanning electronic microscope,nanoindenter,scratch tester,and tribometer were used to study the influence of N2 flow ratio on the composition,microstructure,mechanical properties,and tribological performance of Zr-B-N thin films.Zr-B-N films possessed the typical nano-composite structure,namely that the ZrB2,Zr3N4,Zr2N,ZrN nanocrystalline were surrounded by BN amorphous phase and all the Zr-B-N films exhibited(100)orient preferred growth.With the increase of N2 flow rate,the diffraction peak width on(100)lattice face increased dramatically,but the film hardness decreased from 36.2 GPa to 21.0 GPa.The adhesion between the film and substrate became better and better and the critical load increased gradually from 34.8 N to 55.8 N.The friction coefficient also increased,but it was kept a low value of 0.48 as the N2 flow ratio was 42.9%.ZrN phase growing along(220)lattice plane in the thin films could effectively reduce the friction.The Zr-B-N film possesses typical nano-composite structure and good performance when the N2 flow ratio is 42.9%.

关 键 词：纳米复合薄膜 Zr-B-N薄膜 显微硬度 膜/基结合力 摩擦系数 

分 类 号：TG174.44[金属学及工艺—金属表面处理] TB114.2[金属学及工艺—金属学]