低共熔溶剂中电沉积制备钴-铈合金膜  

Preparation of cobalt-cerium alloy films by electrodeposition in choline chloride-urea deep eutectic solvent

作　　者：熊彤彤 陈必清 李苗 何敏 高利霞 XIONG Tong-tong;CHEN Bi-qing;LI Miao;HE Min;GAO Li-xia(College of Chemistry and Chemical Engineering,Qinghai Normal University,Qinghai 810000,China)

机构地区：[1]青海师范大学化学化工学院,青海西宁810000

出　　处：《电镀与涂饰》2018年第21期971-976,共6页Electroplating & Finishing

基　　金：青海基础研究计划项目(2016-ZJ-753);国家自然科学基金(21553002);教育部科技项目(Z2016099)

摘　　要：利用恒电位技术在由氯化胆碱和尿素组成的低共熔溶剂中在铜基体表面制备了Co–Ce合金膜,用扫描电镜(SEM)、能谱仪(EDS)和X射线衍射(XRD)对其进行表征。考察了电解液中金属离子浓度对合金膜的成分及形貌的影响。采用线性扫描伏安法、循环伏安法、电势阶跃计时电流法等电化学测量技术,研究了Co在铜电极上成核以及二元合金膜沉积的机理。结果表明,在Co^(2+)、Ce^(3+)的浓度分别为0.04 mol/L和0.03 mol/L的条件下以-1.09 V(相对于银电极)电解得到的合金膜表面结晶致密,Ce含量最高(其质量分数为3.3%),而Co含量为82.1%(质量分数)。Co的沉积过程基本符合三维连续成核机制,而Co–Ce合金膜的电沉积遵循诱导共沉积机制。The Co–Ce alloy films were prepared potentiostatically on Cu substrate in a deep eutectic solvent composed of choline chloride and urea,and then characterized by scanning electron microscopy(SEM),energy-dispersive spectroscopy(EDS),and X-ray diffraction(XRD).The effects of the concentrations of metal ions in electrolyte on the composition and morphology of the alloy film were examined.The nucleation mechanism of Co on Cu electrode and the deposition mechanism of the binary alloy film were studied by electrochemical measurement technologies such as linear sweep voltammetry,cyclic voltammetry,and potential-step chronoamperometry.The results showed that the alloy film obtained by potentiostatic electrolysis with 0.04 mol/L Co^2+and 0.03 mol/L Ce^3+at a potential of-1.09 V(vs.Ag electrode)has a compact crystalline surface with Co 82.1wt.%and Ce 3.3wt.%(the highest content among all alloy films prepared).The growth behavior of Co is principally consistent with the three-dimensional progressive nucleation,while the electrodeposition process of the Co–Ce alloy film follows the induced codeposition mechanism.

关 键 词：钴-铈合金 低共熔溶剂 恒电位电解 连续成核 诱导共沉积 形貌 电化学 

分 类 号：TQ153.2[化学工程—电化学工业]