ZHL无氰镀银液在滚镀工艺上的应用  

Application of ZHL cyanide-free silver plating solution to barrel plating

作　　者：孙志 程娜 赵博儒 赵健伟[1] SUN Zhi;CHENG Na;ZHAO Bo-ru;ZHAO Jian-wei

机构地区：[1]嘉兴学院材料与纺织工程学院中澳先进材料与制造研究院,浙江嘉兴314001

出　　处：《电镀与涂饰》2018年第24期1134-1138,共5页Electroplating & Finishing

摘　　要：将ZHL碱性无氰镀银液应用于滚镀工艺中。研究了不同因素对镀银层外观的影响,得到适宜的工艺条件为:母液与去离子水的体积比1∶1,工件占槽比1/4,滚筒转速10～14 r/min,温度35～40°C,电流密度0.8～1.2 A/dm^2。推荐的工艺条件为:母液与去离子水的体积比1∶1,工件占槽比1/4,滚筒转速12 r/min,温度35°C,电流密度0.8 A/dm2。在上述条件下所得镀银层为光亮的银白色,显微硬度适中,结晶细腻、均匀。ZHL alkaline cyanide-free silver plating solution was used for barrel plating.Some factors affecting the appearance of silver coating were studied.The suitable process conditions were determined as follows:volume ratio of the concentrated makeup solution to water1:1,volume ratio of workpiece to the barrel1/4,barrel rotating rate10-14r/min,temperature35-40°C,and current density0.8-1.2A/dm2.The recommended process conditions are as follows:volume ratio of the concentrated makeup solution to water1:1,volume ratio of workpiece to the barrel1/4,barrel rotating rate12r/min,temperature35°C,and current density0.8A/dm2.The silver coating obtained under the recommended conditions is brightly silvery with a moderate microhardness and a fine and uniform crystalline structure.

关 键 词：无氰滚镀银 外观 显微结构 晶粒尺寸 显微硬度 

分 类 号：TQ153.16[化学工程—电化学工业]