磁控溅射制备AlCrWTaTiNb高熵合金薄膜低温等离子体氮化  

Low temperature plasmatic nitriding of AlCrWTaTiNb high entropy alloy film synthesized by magnetron sputtering

作　　者：马铭 任瑛[3] 侯晓多[1,2] 陈国清[1,2] 张贵锋 MA Ming;RE NYing;HOU Xiaoduo;CHEN Guoqing;ZHANG Guifeng(School of Materials Science and Engineering, Dalian University of Technology, Dalian 116024, China;Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education,Dalian University of Technology, Dalian 116024, China;School of Materials Science and Engineering, Henan University of Technology, Zhengzhou 450001, China)

机构地区：[1]大连理工大学材料科学与工程学院,辽宁大连116024 [2]大连理工大学三束材料改性教育部重点实验室,辽宁大连116024 [3]河南工业大学材料科学与工程学院,河南郑州450001

出　　处：《大连理工大学学报》2019年第1期28-34,共7页Journal of Dalian University of Technology

基　　金：国家国际科技合作专项(2015DFR60370);航空科学基金资助项目(20153663010)

摘　　要：采用磁控溅射技术沉积了AlCrWTaTiNb多元高熵合金薄膜,在400℃以下采用高密度等离子体设备对沉积的薄膜进行了氮化处理.用X射线衍射(XRD)、原子力显微镜和纳米压痕对氮化后薄膜的微观结构、表面形貌以及力学性能进行了分析.结果表明,高熵效应有利于降低氮化温度,最低氮化温度仅为200℃,所有的(AlCrWTaTiNb)N薄膜晶体结构呈现简单的FCC结构,且具有(111)择优取向.随着氮化温度的增加,(AlCrWTaTiNb)N复合薄膜的显微硬度、弹性模量和对应的H3/E2均增大,氮化温度为300℃时,达到最大,随后略微下降.随氮化时间的延长,显微硬度和弹性模量均逐渐增加.Multi-component high entropy AlCrWTaTiNb alloy films were prepared using magnetron sputtering technique and then were nitrided below 400℃ by means of a high density plasma equipment. The microstructure, surface morphology and mechanical properties of the nitrided films were investigated by X-ray diffraction (XRD), atomic force microscopy and nano indentation, respectively. The results show that the lowest nitriding temperature is only 200℃ in the experimental conditions and the high entropy effect is really propitious to reduce nitriding temperature. All the (AlCrWTaTiNb)N films crystals are simple FCC structure with a (111) preferred orientation. With the increase of nitriding temperature, the micro-hardness, the elastic modulus and the corresponding H3/E2 of the (AlCrWTaTiNb)N composite films increase and reach maximum at 300℃, and then decrease slightly. With the prolongation of nitriding time, the micro-hardness and elastic modulus increase gradually.

关 键 词：多元高熵合金薄膜 低温渗氮 力学性能 

分 类 号：TG174.445[金属学及工艺—金属表面处理]