真空中脉冲激光烧蚀制备银纳米晶粒在水平衬底上的分布特性  

Distribution Characteristic of Ag Nanoparticles on the Horizontal Substrates during Pulsed Laser Ablation Process in Vacuum

作　　者：邓泽超[1] 王旭[1] 刘建东 孟旭东 丁学成[1] 褚立志[1] 王英龙[1] DENG Ze-chao;WANG Xu;LIU Jian-dong;MENG Xu-dong;DING Xue-cheng;CHU Li-zhi;WANG Ying-long(National-Local Joint Engineering Laboratory of New Energy Photoelectric Devices, Key Laboratory of Photo-Electronics Information Materials of Hebei Province, College of Physics Science and Technology, Hebei University, Baoding 071002, China)

机构地区：[1]河北大学物理科学与技术学院河北省光电信息材料重点实验室新能源光电器件国家地方联合工程实验室,保定071002

出　　处：《人工晶体学报》2019年第1期18-23,共6页Journal of Synthetic Crystals

基　　金：河北省自然科学基金(A2018201249);河北省研究生创新资助项目(CXZZBS2017024);河北大学自然科学研究计划项目(799207217042)

摘　　要：在室温、真空环境中,通过XeCl准分子脉冲激光烧蚀银靶,烧蚀产物沉积在水平放置的Si(111)衬底上。利用扫描电子显微镜(SEM)、X射线衍射(XRD)仪、探针式表面轮廓(PTSP)仪和选区电子衍射(SAED)对沉积所得的样品进行表征。结果表明,样品主要由具有不同尺寸的银纳米晶粒组成;随着衬底与靶面水平距离的增加,样品厚度和晶粒尺寸逐渐减小;样品的(111)和(200)晶面的XRD特征谱线强度,随着衬底位置的改变而变化。在增加激光能量密度、衬底与烧蚀焦点垂直距离的情况下,晶粒尺寸及样品XRD特征谱线变化规律并未发生明显变化。结合银纳米晶粒传输特性和沉积样品沿不同晶面生长所需表面能的差异,对实验结果进行了分析。Ag target was ablated by XeCl excimer laser in vacuum at room temperature,the samples were deposited on Si(111)substrates located horizontally.The detection results of Scanning Electron Microscope(SEM),X-ray Diffraction(XRD),Probe Type Surface Profiler(PTSP)and Selected Area Electric Diffraction(SAED)indicated that the samples are composed by Ag nanoparticles with different size,the depth of samples and size of nanoparticles decrease with the addition of distance between target and substrates,the intensity of XRD patterns of(111)and(200)crystallographic face change for samples deposited on different substrates.Increased the laser fluence and vertical distance between substrates and the ablated spot,the change rule of size of nanoparticles and spectra of XRD was not obvious.The experimental results were analyzed on the base of the transportation of Ag nanoparticles and the difference surface energy for different crystallographic face growth.

关 键 词：银纳米晶粒 脉冲激光烧蚀 真空 表面能 

分 类 号：O469[理学—凝聚态物理]