柱状晶结构热障涂层的沉积生长和织构研究  

Deposition and Texture of Columnar Thermal Barrier Coatings

作　　者：程泽飞 杨加胜[1,2] 邵芳 赵华玉[1,2] 钟兴华 庄寅[1,2] 倪金星 陶顺衍[1,2] CHENG Zefei;YANG Jiasheng;SHAO Fang;ZHAO Huayu;ZHONG Xinghua;ZHUANG Yin;NI Jinxing;TAO Shunyan(Key Laboratory of Inorganic Coating Materials,Shanghai Institute of Ceramics,Chinese Academy of Sciences,Shanghai 201899,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China)

机构地区：[1]中国科学院上海硅酸盐研究所中国科学院特种无机涂层重点实验室,上海201899 [2]中国科学院大学材料与光电研究中心,北京100049

出　　处：《航空制造技术》2019年第3期48-54,共7页Aeronautical Manufacturing Technology

摘　　要：等离子体–物理气相沉积(PS–PVD)技术融合了等离子体喷涂(PS)和电子束–物理气相沉积(EB–PVD)的优点,沉积效率高、成本相对较低和可制备柱状晶结构涂层。因此,PS–PVD在制备先进发动机热障涂层(TBCs)上备受关注。利用PS–PVD工艺制备了多种结构的氧化钇部分稳定氧化锆(YSZ)TBCs,采用场发射扫描电镜(FE–SEM)和电子背散射衍射(EBSD)观察和分析涂层微结构与晶体织构特征。试验表明:制备的YSZ涂层为柱状晶结构,在同一喷涂距离处,沿喷涂斑点中心向外围过渡区域,柱状晶端面由四棱锥结构向菜花状结构转变,单柱状晶具有一定的晶体取向,但不同的柱状晶具有不同的结晶取向,制备态陶瓷层整体未呈现明显的择优取向和应力集中。As a novel technique,plasma spray-physical vapor deposition(PS-PVD)process combines advantages of high deposition rates and cost-efficiency of plasma spraying and columnar structure of electron beam-physical vapor deposition(EB-PVD),so that PS-PVD has received considerable attention to manufacture thermal barrier coatings(TBCs)for some advanced turbines.In this paper,yttria stabilized zirconia(YSZ)coatings were fabricated by PS-PVD.Field emission scanning electron microscopy(FE-SEM)and electron backscatter diffraction(EBSD)were used to observe and analyze the microstructure and crystallographic feature of the coating.The result shows that the microstructure of as-sprayed YSZ coating is columnar structure crystals.During the process of deposition,at a certain spraying distance,the transition zone from the center to the edge of the spraying spot,the end surface of columns is transformed from a quadrangular pyramid structure to a cauliflower-like structure,and the mono-column exhibits a certain preferred orientation,but other columns have different orientations,and the ceramic does not exhibit a distinct preferred orientation on the whole.

关 键 词：等离子体-物理气相沉积 氧化钇稳定氧化锆(YSZ)涂层 柱状晶结构 择优取向 应力集中 

分 类 号：TG174.4[金属学及工艺—金属表面处理]