等离子体光谱光源技术的研究进展  

The Research Progress in Plasma Spectral Light Source Technology for Atomic Emission Spectroscopy

作　　者：辛仁轩[1] XIN Renxuan(Institute of Nuclear Energy and New Energy Technology,Tsinghua University,Beijing 100084,China)

机构地区：[1]清华大学核能与新能源技术研究院,北京100084

出　　处：《中国无机分析化学》2019年第1期17-26,共10页Chinese Journal of Inorganic Analytical Chemistry

摘　　要：光谱光源是光谱仪器和光谱技术的核心,等离子体光源是原子发射光谱技术的活跃领域之一,电感耦合等离子体(ICP)已成功地应用于原子发射光谱和无机质谱仪器。由于ICP光源采用氩气作为工作气体,耗量较大,降低氩气用量成为近些年来原子光谱技术研究和改进的重要目标。为此目的,已研究过各种低耗氩ICP光源,非氩气ICP光源,微波等离子体光源,射频电容耦合等离子体光源等。综述了近年这些等离子体发射光源的结构,分析性能及特点,以及它们所用工作气体情况。并归纳总结出,评价各种等离子体发射光谱光源应包括:等离子体温度(激发温度,气体温度),电子密度,工作气体种类及用量,元素检出限,光源的稳健性及经济方面等。The spectral light source is the center of spectral instrument and spectral technology,the plasma light source is one of the active fields of atomic emission spectroscopy technology,inductively coupled plasma(ICP)light source has been successfully applied to atomic emission spectrometry and inorganic mass spectrometry.Because use argon as working gas at Ar-ICP source and the argon consumption is larger,so reduce the dosage of argon become the important goals of research and improvement of the atomic spectrum technology in recent years.For this purpose,a variety of spectral light sources were studied,included the argon ICP source of various low argon ICP source,the microwave plasma source(MIP,MPT)and radio frequency(rf)capacitively coupled plasma source(CCP)etc.In this paper,the structures,properties and characteristics of these plasma emission light sources were reviewed.It is also to generalize and summarize that the evaluation of various plasma emission spectral light sources should include the plasma temperature(excitation temperature T exc,gas temperature T g),electron density,the type of working gas and amounts of gas,detection limits of elements,robustness of light sources and economical aspects etc.

关 键 词：等离子体光源 ICP-AES 高功率微波等离子体光源(MWP) 射频电容耦合等离子体(rf-CCP) 

分 类 号：O657.31[理学—分析化学] TH744.11[理学—化学]