Imaging the Dissociation Dynamics of Si2+ via Two-Photon Excitation at 193 nm  

在193nm关于Si2分子的离子解离动力学的成像研究（英文）

作　　者：Yu-jie Ma Fang-fang Li Jia-xing Liu Feng-yan Wang 马玉杰;李芳芳;刘嘉兴;王凤燕(复旦大学化学系上海市分子催化和功能材料重点实验室能源材料化学协同创新中心)

机构地区：[1]Department of Chemistry and Shanghai Key Laboratory of Molecular Catalysis and Innovative Materials, Collaborative Innovation Center of Chemistry for Energy Materials (iChEM), Fudan University, Shanghai 200433, China

出　　处：《Chinese Journal of Chemical Physics》2019年第1期129-133,I0003,共6页化学物理学报（英文）

基　　金：supported by the National Natural Science Foundation of China (No.21673047, No.21327901, and No.21322309);the Shanghai Key Laboratory Foundation of Molecular Catalysis and Innovative Materials;the Program for Professor of Special Appointment (Eastern Scholar) at Shanghai Institutions of Higher Learning

摘　　要：In the one-color experiment at 193nm, we studied the photodissociation of Si2+ ions prepared by two-photon ionization using the time-sliced ion velocity map imaging method. The Si+ imaging study shows that Si2+ dissociation results in two distinct channels: Si(3Pg)+Si+(2Pu) and Si(1D2)+Si+(2Pu). The main channel Si(3Pg)+Si+(2Pu)) is produced by the dissociation of the Si2+ ions in more than one energetically available excited electronic state, which are from the ionization of Si2(v=0-5). Particularly, the dissociation from the vibrationally excited Si2(v=1) shows the strongest signal. In contrast, the minor Si(1D2)+Si+(2Pu) channel is due to an avoided crossing between the two 22Πg states in the same symmetry. It has also been observed the one-photon dissociation of Si2+(X4Σg-) into Si(1D2)+Si+(2Pu) products with a large kinetic energy release.

关 键 词：Slice imaging PHOTODISSOCIATION Silicon dimmer Si2 193nm 

分 类 号：O643.12[理学—物理化学]