磁控溅射功率对WO_x薄膜结构和光催化活性的影响  

Effect of Magnetron Sputtering Power on Structure and Photocatalytic Activity of WO_x Thin Films

作　　者：李渊 赵青南[1,2] 张泽华 刘翔 曾瑧[1] 董玉红 LI Yuan;ZHAO Qing-nan;ZHANG Ze-hua;LIU Xiang;ZENG Zhen;DONG Yu-hong(State Key Laboratory of Silicate Materials for Architecture,Wuhan University of Technology,Wuhan 430070,China;Jiangsu Xiuqiang Glasswork Co.,Ltd.,Suqian 223800,China)

机构地区：[1]武汉理工大学硅酸盐建筑材料国家重点实验室,武汉430070 [2]江苏秀强玻璃工艺股份有限公司,宿迁223800

出　　处：《硅酸盐通报》2019年第2期512-516,529,共6页Bulletin of the Chinese Ceramic Society

基　　金：产学研合作项目(20131h0467)

摘　　要：采用射频磁控溅射法在非加热载玻片上制备WO_x薄膜。通过X射线衍射仪(XRD)、场发射扫描电子显微镜(SEM)、X射线光电子能谱仪(XPS)、台阶仪、UV-Vis-NIR3600型紫外可见分光光度计和接触角计,研究不同溅射功率下薄膜的物相结构、表面形貌、元素价态、膜厚、光学性能、光催化和亲水性能。结果表明,随着溅射功率增加,薄膜的光学带隙逐渐减小,薄膜光催化活性与亲水性均提高。180 W溅射功率沉积的薄膜放置在亚甲基蓝溶液里,然后用紫外灯照射210 min,亚甲基蓝降解率达到97%; WO_x薄膜在紫外灯下照射120 min时,水接触角达到12. 2°,停止照射之后放置在可见光下260 min,水接触角达到19. 1°。The WOx thin films were prepared on unheated glass slides by RF magnetron sputtering.The phase structure,surface morphology,elemental state,film thickness,optical properties,photocatalytic and hydrophilic activity of deposited films under different sputtering powers were studied by X-ray diffraction(XRD),Step Profiler meter,Contact angle meter,field emission scanning electron microscopy(SEM)and UV-Vis-NIR3600 UV-Vis spectrophotometer.The obtained results show that,as the sputtering power increases,the optical band gap of the film gradually decreases,the photocatalytic activity and hydrophilicity of the film are increasing.The 180 W sputtering power deposited film was placed in methylene blue solution and then irradiated with UV lamp for 210 min,the methylene blue degradation rate reached 97%.When W0X film is exposed to UV light for 120 min,the water contact angle of the W0X film reaches 12.2°,placed under visible light after stopping UV irradiation 260 min,the water contact angle reaches 19.1°.

关 键 词：WOx薄膜 射频磁控溅射功率 光催化 亲水性 

分 类 号：TG146[一般工业技术—材料科学与工程]