基于一维光子晶体的1064nm激光窄带滤光膜的设计  

Design of 1064 nm Laser Narrowband Filter Film Based on the One-dimensional Photonic Crystal

作　　者：林伟丽 邱桂花[2] 韩建龙[2] 于名讯 张瑞蓉[2] 牛玉超[1] LIN Weili;QIU Guihua;HAN Jianlong;YU Mingxun;ZHANG Ruirong;NIU Yuchao(School of Materials Science and Engineering,Shandong Jianzhu University,Jinan 250101,China;China North Industries Group Corporation Institute 53,Jinan 250031,China)

机构地区：[1]山东建筑大学材料科学与工程学院,山东济南250101 [2]中国兵器工业集团第五三研究所,山东济南250031

出　　处：《红外技术》2019年第3期220-226,共7页Infrared Technology

基　　金：兵器基金项目

摘　　要：为了获取具有宽截止带的1064 nm激光窄带滤光膜,本文以含缺陷的一维光子晶体为基础设计了两种不同的结构。模拟分析了缺陷层引入方式、缺陷层光学厚度、缺陷层材料折射率、光子晶体周期数和缺陷层位置等因素对窄通带位置、宽度和强度的影响,明确了其影响规律。通过优化光子晶体的结构参数优化滤光膜窄通带、拓宽截止带,设计了截止范围在200～1500 nm、1064 nm透过率大于90%的多层结构滤光膜。In order to obtain a 1064 nm laser narrowband filter with a wide cutoff band,two different structures were designed based on one-dimensional photonic crystals with defects.The effects of the defect layer introduction method,optical thickness,refractive index of the defect layer,number of photonic crystal cycles,and optical position of the defect layer on the position,width,and intensity of the narrow band were analyzed,and the influence rule was clarified.By optimizing the structural parameters of the photonic crystal,the narrow band of the filter film was optimized,and the cutoff band was broadened.A multilayer structure filter film with a cutoff range of 200-1500 nm and a 1064 nm transmittance of more than 90%was designed.

关 键 词：一维光子晶体 滤光膜 1064nm激光 窄通带 

分 类 号：O484[理学—固体物理]