Si对Hastelloy N合金氧化行为的影响  

Effects of Silicon on the Oxidation Behavior of Hastelloy N Superalloy at 850 °C

作　　者：郭伟杰 李建树 陆燕玲[1] 张继祥[2] 周兴泰[1] Guo Weijie;Li Jianshu;Lu Yanling;Zhang Jixiang;Zhou Xingtai(Shanghai In stitute of Applied Physics,Chinese Academy of Sciences,Shanghai 201800,China;Chongqing Jiaotong University,Chongqing 400074,China)

机构地区：[1]中国科学院上海应用物理研究所,上海201800 [2]重庆交通大学,重庆400074

出　　处：《稀有金属材料与工程》2019年第3期885-891,共7页Rare Metal Materials and Engineering

基　　金：国家自然科学基金(51674237);超轻材料与表面技术教育部重点实验室资助

摘　　要：利用不连续增重法,研究了不同Si含量的Hastelloy N合金850℃恒温氧化行为。结果表明,随Si含量的增加,氧化动力学曲线保持抛物线规律。氧化100 h后,氧化膜出现分层现象,最外层均为NiO、NiFe_2O_4等复合氧化物,中间层为Cr_2O_3、MoO_2等氧化物。由于在氧化层与基体界面处形成连续致密的SiO_2层,有效阻止Cr离子向外扩散进入氧化层,促进Hastelloy N合金中间层形成较为致密的Cr_2O_3氧化层,提高了合金的抗氧化性能。The isothermal oxidation behavior of Hastelloy N superalloy with different silicon contents at 850°C in air was investigated by a discontinuous increasing weight method.The results show that oxidation mass gain kinetics of the samples follows the parabolic law with increasing Si contest.It is observed that the surfaces of the alloys exhibit a multi-layer structure after 100 h oxidation.The outer oxide film of Hastelloy N superalloy mainly consists of NiO,NiFe2O4 and other oxide composites.The middle layer is confirmed to be Cr2O3 and MoO2.A continuous and dense SiO2 sublayer is formed at the metal-oxide interface,it is effective to prevent Cr diffusion.The addition of Si promotes the formation of a relatively continuous and compact Cr2O3 and it can strongly improve the oxidation resistance.

关 键 词：HASTELLOY N合金 高温氧化 SI 氧化动力学 氧化层 

分 类 号：TG146.15[一般工业技术—材料科学与工程] TG132.33[金属学及工艺—金属材料]