辉光放电质谱法在高纯材料分析中的应用  

Application of GDMS for the Analysis of High Purity Materials

作　　者：王爽 白杉 徐平 王树英 郭雅尘 左文家 张腾月 周渊名 梁雪松 洪梅 WANG Shuang;BAI Shan;XU Ping;WANG Shuying;GUO Yachen;ZUO Wenjia;ZHANG Tengyue;ZHOU Yuanming;LIANG Xuesong;HONG Mei(National Quality Supervison and Inspection Center for Photovoltaic Material, Jinzhou Institute of Product Quality Supervision and Inspection, Jinzhou,Liaoning 121000,China;School of Chemical Biology & Biotechnology, Peking University, Shenzhen, Guangdong 518055,China)

机构地区：[1]锦州市产品质量监督检验所国家光伏材料质量监督检验中心,辽宁锦州121000 [2]北京大学化学生物学与生物技术学院,广东深圳518055

出　　处：《中国无机分析化学》2019年第2期24-34,共11页Chinese Journal of Inorganic Analytical Chemistry

基　　金：国家自然科学基金(21671010);深圳市孔雀技术创新项目(KQCX2015032709315529)

摘　　要：高纯材料是现代高新技术发展的基础,在电子、光学和光电子等尖端科学领域发挥着重要作用。采用固体样品直接分析的辉光放电质谱法(GDMS),在高纯金属、高纯半导体材料的痕量和超痕量杂质分析中有着非常广泛的应用。综述了GDMS法对高纯金属、高纯半导体材料进行的元素分析,并对分析过程中工作参数、溅射时间、干扰峰等因素的影响进行了阐述。同时,也详述了应用GDMS法对高纯金属钛、镉,高纯半导体硅,分别进行的痕量杂质元素分析,结果显示放电稳定性良好,典型元素含量的相对标准偏差均在较为理想范围内。GDMS应用前景广泛,未来,GDMS将在除固体样品之外的其他样品类型的分析领域中发挥重要作用。High purity material is the basis of modern high technology development, and plays an important role in the fields of electronics, optics and optoelectronics. Glow discharge mass spectrometry (GDMS), as a solid sample direct analysis technique,has been widely used intrace and ultra-trace analysis impurities in high purity metal and high purity semiconductor materials. This paper reviewed the element analysis of high purity metal and high purity semiconductor material by GDMS, and explained the influences of working parameters, sputtering time and interference peak. It summarized that the trace impurity elements analysis of high purity titanium, cadmium, highpurity silicon by GDMS. The results shows that good discharge stability and typical elements relative standard deviation are in the ideal range. GDMS has a broad application prospect,in the future, GDMS will play an important role in the analysis of other sample types than solid samples.

关 键 词：辉光放电质谱法 高纯金属 高纯半导体 应用 

分 类 号：O657.63[理学—分析化学] TH843[理学—化学]