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作 者:钱慧璇 孙杰[1] Souavang XAIKOUA 明庭云 QIAN Hui-xuan;SUN Jie;XAIKOUA Souavang;MING Ting-yun(School of Environmental and Chemical Engineering, Shenyang Ligong University, Shenyang 110159, China)
机构地区:[1]沈阳理工大学环境与化学工程学院
出 处:《材料保护》2019年第4期11-13,共3页Materials Protection
摘 要:为了研究锡採离子在低共熔离子液体体系中的氧化还原行为及镀层的相组成,以氯化胆碱-乙二醇(ChCl-EG)低共熔离子液体体系为基础液进行锡镰合金电沉积行为的研究。使用循环伏安测试法对锡辣离子在该体系中的阴极还原行为进行研究,采用X射线衍射仪(XRD)对Sn-Ni沉积层的相组成进行分析;采用极化曲线对沉积层耐蚀性等进行了研究。结果表明:锡辣2种离子共存于该离子液体时只显示出1个阴极沉积峰,峰值电位-0.65V;沉积1h所得锡標合金沉积层为Ni3Sn2相,腐蚀电流密度为1.619×10^-6A/cm^2.In order to study the redox behavior of tin and nickel ions in deep eutectic ionic liquid system and the phase composition of the coating ,the deep eutectic ionic liquid system of choline chloride and ethylene glycol (ChCl-EG) was used as the basic solution to analyze the electrodeposition behavior of tin-nickel alloy. The cathodic reduction behaviors of Sn^2+ and Ni^2+ in the system were studied by cyclic voltammetry (CV), and the phase composition of Sn-Ni deposited layer was analyzed by X-ray diffractometer (XRD). Moreover, the corrosion resistance of deposited layer was evaluated by polarization curves. Results showed that when tin ions and nickel ions were co-existing in the ionic liquid, only one cathodic deposition peak at-0.65 V appeared. The tin-nickel alloy deposited layer obtained after deposition for 1 h was Ni3Sn2 phase, and the corrosion current density of the Sn-Ni alloy was 1.619×10^-6A/cm^2.
分 类 号:TQ153.2[化学工程—电化学工业]
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