阳极微弧等离子体扩渗表面处理技术的研究进展  

Progress of Anode Micro-Arc Plasma Saturation

作　　者：缪倩倩 陈海燕 蒋永锋[1] 包晔峰[1] MIAO Qian-qian;CHEN Hai-yan;JIANG Yong-feng;BAO Ye-feng(College of Mechanical and Electrical Engineering, Hohai University, Changzhou 213022, China)

机构地区：[1]河海大学机电工程学院

出　　处：《材料保护》2019年第4期134-141,共8页Materials Protection

基　　金：江苏省研究生科研与实践创新计划项目(KYCX 17_0535);中央高校基本科研业务费专项资金资助(2017B676X14)

摘　　要：阳极微弧等离子体扩渗是一项新颖的材料表面处理技术,其突出的表面处理优势使该技术极具发展潜力。结合现有的国内外研究理论和自身的试验经验,综述了对目前发展的阳极微弧等离子体扩渗技术的基本认识。从热特性、传质特性、电特性、电化学特性特等几个方面论述了阳极微弧等离子体扩渗过程的物理及化学特性,详细介绍了阳极微弧等离子体扩渗技术的研究现状,并展望了阳极微弧等离子体扩渗技术的研究和应用前景。Anode micro-arc plasma saturation is a novel technique of surface modification, and the outstanding processing advantages of which bring it with great development potential. Based on the existing research results at home and abroad and the self-experimental results, the basic knowledge of anode micro-arc plasma saturation was summarized. The physical and chemical characteristics of anode micro-arc plasma saturation were discussed from the aspects of thermal, mass transfer, electrical and electrochemical characteristics. In addition, the research status of anode micro-arc plasma saturation was described in detail, and the research prospects and application of anode micro-arc plasma saturation were put forward.

关 键 词：阳极微弧等离子体扩渗 表面处理 物理化学特性 

分 类 号：TG156.8[金属学及工艺—热处理]