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作 者:谭晓晓 孙丹[2] 范其香[3] TAN Xiaoxiao;SUN Dan;FAN Qixiang(Engineering Training Center,Shanghai University of Engineering Science,Shanghai 201620,China;School of Materials Engineering,Shanghai University of Engineering Science,Shanghai 201620,China;Tianjin Key Laboratory of High Speed Cutting and Precision Machining,Tianjin University of Technology and Education,Tianjin 300222,China)
机构地区:[1]上海工程技术大学工程实训中心,上海201620 [2]上海工程技术大学材料工程学院,上海201620 [3]天津职业技术师范大学高速切削与精密加工重点实验室,天津300222
出 处:《腐蚀科学与防护技术》2019年第3期285-290,共6页Corrosion Science and Protection Technology
基 金:国家自然科学基金(51501109和51501130)~~
摘 要:在Ni基体电沉积不同厚度的Ni-CeO2复合镀层并对其进行620℃低温渗铝,制备了剩余复合镀层厚度分别约为10和45μm厚的δ-Ni2Al3-CeO2/Ni-CeO2涂层体系。1000℃真空退火5h后,以上两种涂层体系均可在铝化物/镀层界面形成CeO2富集层。但剩余复合镀层厚度为10μm的涂层体系由于氧化物富集程度不足,涂层退化程度较剩余复合镀层厚度为45μm的涂层体系严重。可见,在镀层氧化物颗粒含量一定的情况下,渗铝后剩余镀层厚度是影响扩散障有效性的重要因素。Ni-CeO2 composite films with different thicknesses were electrodeposited on Ni substrate and then aluminized at 620°C. Accordingly, two coating (6-Ni2AI3-CeO2/Ni-CeO2) systems consisted of an outer portion of 5-Ni2AI3-CeO2 and an inner portion of remaining Ni-CeO2 films of ca 10 and 45 pm respectively in thick ness were prepared. After vacuum ann eali ng at 1000°C for 5 h, the above two coati ng systems all formed a CeO2-rich layer in between the outer aluminide coati ng and the inner Ni-CeO2 film. How? ever, the degradatio n of the coati ng system with the inner Ni-CeO2 film of 10 pm was more serious than that of 45 pm due to the insufficient oxides enrichment at the interface of aluminide/Ni-CeO2. It can be seen that the thickness of the remaining inner Ni-CeO2 film after aluminizing is an important factor responsible to the effectiveness of diffusion barrier for the prepared Ni-CeO2 film containing a designed amount of CeO2 particles.
分 类 号:TG172[金属学及工艺—金属表面处理]
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