晶体生长过程高精度温度控制系统设计  

Design of High Precision Temperature Control System in Growth of Crystals

作　　者：沈正阳 潘丰 SHEN Zhengyang;PAN Feng(Key Laboratory of Advanced Process Control for Light Industry (Ministry of Education) ,Jiangnan University,Wuxi 214122,China)

机构地区：[1]江南大学轻工过程先进控制教育部重点实验室

出　　处：《机械制造与自动化》2019年第3期220-222,228,共4页Machine Building & Automation

摘　　要：目前晶体生长装置通常采用PLC进行控制,但常规PLC的温度测量精度达不到要求的控制精度。采用PLC和高精度智能温度控制表结合,使生长槽温度精度达到±0.01℃。同时设计顺序降温控制,在规定的时间内,可进行阶段性的降温达到设定的温度。该系统已在实际生产中使用,满足了高品质晶体生长的要求。Currently,PLC is adopted in the crystal growth device.The temperature measurement accuracy of conventional PLC can not meet the requirement of the control precision.If PLC is used with high precision intelligent temperature regulator,the measured temperature precision of the growth trough is up to±0.01℃.At the same time,the sequential temperature reduction control is also designed.In the specified time period,the temperature can be reduced to the set temperature.The system is used in actual production.It can meet the requirement of high quality crystal growth.

关 键 词：晶体生长 温度控制 顺序控制 系统设计 

分 类 号：TP274[自动化与计算机技术—检测技术与自动化装置]