利用等离子反应器从SiF4与CH4制备HF和SiC的探索研究  

A study on the reaction of silicon tetrafluoride and methane in plasma reactor to produce anhydrous hydrogen fluoride and silicon carbide

作　　者：李玉叶 黄忠[2] 田强[1,2] Li Yuye;Huang Zhong;Tian Qiang(Research Center,Yunnan Yuntianhua Co. Kunming 650228,China;Yunnan Chemical Research Institute,Kunming 650228,China)

机构地区：[1]云南云天化股份有限公司研发中心,云南昆明650228 [2]云南省化工研究院,云南昆明650228

出　　处：《云南化工》2019年第5期18-20,共3页Yunnan Chemical Technology

基　　金：云南省科技创新平台建设计划2012CF028和2015DC008的支持

摘　　要：研究了一个新型反应,即SiF4气体与CH4气体反应生成无水HF气体和SiC固体。该反应在最大能量为20eV的等离子反应器的固定床中进行,反应一段时间后,收集反应器壁上固体,通过分析固体中的碳含量来判断四氟化硅和甲烷的反应情况。结果表明:四氟化硅和甲烷可以发生反应,但是速度十分缓慢。This paper studies a new reaction,the reaction of silicon tetrafluoride and methane to produce anhydrous hydrogen fluoride and silicon carbide.The reaction is carried out in a fixed bed in a plasma reactor with a maximum energy of 20 eV. After a period,solids are collected from the reactor wall,determine the reaction of silicon tetrafluoride and methane by analyzing the carbon content in the solid. The test results show that silicon tetrafluoride and methane can react,but the speed is very slow.

关 键 词：等离子体反应器 四氟化硅 甲烷 固定床 碳化硅 

分 类 号：O646.9[理学—物理化学]