CeO2改善低温渗铝涂层抗氧化性能的研究（英文）  

Improved Oxidation Resistance of a CeO2-modified Aluminide Coating by Low-Temperature Pack Cementation

作　　者：谭晓晓[1] Tan Xiaoxiao(Shanghai University of Science and Engineering, Shanghai 201620,China)

机构地区：[1]上海工程技术大学

出　　处：《稀有金属材料与工程》2019年第6期1785-1790,共6页Rare Metal Materials and Engineering

基　　金：National Natural Science Foundation of China(51501109)

摘　　要：在Ni基体上电沉积纯Ni镀层和Ni-CeO2复合镀层并对其进行620℃低温渗铝,制备了无CeO2和CeO2改性的铝化物涂层。将以上2种涂层在1000℃下氧化,研究CeO2颗粒的加入对氧化膜的生长速率和粘附性能的影响。结果表明,在δ-Ni2Al3涂层中加入纳米CeO2颗粒可以推迟一层完整α-Al2O3膜的形成时间,降低氧化膜的生长速率。此外,纳米CeO2颗粒的加入提高了氧化膜的粘附性。原因是与没有CeO2掺杂的涂层相比,CeO2改性铝化物涂层在氧化膜/涂层界面上形成的空洞尺寸较小。CeO2-free and Ce O2-modified aluminide coatings were prepared by aluminizing pure Ni film and Ni-CeO2 film on Ni plate at 620°C,respectively.The effect of the CeO2 addition on the growth rate and adhesion of the alumina scale at 1000°C was investigated.The results show that the addition of nanometer Ce O2 in aluminide coating ofδphase delays the formation of a continuousα-Al2O3 scale and decreases the growth rate of alumina scale during oxidation.Moreover,the alumina scale adhesion is improved by the addition of nanometer CeO2 due to the smaller cavities formed at the alumina scale/coating interface compared with the CeO2-free one.

关 键 词：铝化物涂层 氧化 包埋渗铝 活性元素效应 

分 类 号：TG174.4[金属学及工艺—金属表面处理]