检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:刘兴龙 李宏 郭忠达[1] 阳志强[1] 李世杰 LIU Xinglong;LI Hong;GUO Zhongda;YANG Zhiqiang;LI Shijie(School of Optoelectronic Engineering,Xi'an Technological University,Xi'an 710021,China)
机构地区:[1]西安工业大学光电工程学院
出 处:《西安工业大学学报》2019年第4期394-399,共6页Journal of Xi’an Technological University
基 金:陕西省重点研发计划项目(2017ZDXM-GY-122);陕西省教育厅重点实验室科研计划项目(17JS047)
摘 要:为研究锗砷硒(Ge22As20Se58)硫系红外玻璃的最佳抛光参数,比较了CeO2抛光液和Al2O3抛光液、聚氨酯抛光模和黑色阻尼布作为抛光垫时的优劣性。通过4因素3水平的正交实验,采用古典法平摆式磨抛技术研究锗砷硒玻璃的抛光工艺,使用Taylor Hobson粗糙度轮廓仪和Zygo Newview 8200对抛光后的锗砷硒玻璃表面粗糙度进行检测。研究结果表明:相比较于聚氨酯抛光模,黑色阻尼布作为抛光垫时玻璃未产生划痕,抛光时Al2O3抛光液的抛光效果优于CeO2抛光液,锗砷硒玻璃表面粗糙度可达2.59nm,得到了最佳抛光工艺。In order to obtain the optimal polishing parameters of Ge22As20Se58 chalcogenide infrared glass,the advantages and disadvantages of CeO2 polishing solution and Al2O3 polishing solution,polyurethane polishing mold and black damper cloth as polishing pad were compared.Through the orthogonal experiments involving four factors and three levels,the polishing process of GeAsSe glass was studied by using the classical flat pendulum grinding and polishing technology,and the surface roughness of polished GeAsSe glass was checked with a Taylor Hobson roughness profilometer and Zygo Newview 8200.The results show that unlike the polyurethane polishing die,the glass is not scratched when the black damper is used as a polishing pad,and that the CeO2 polishing liquid is better than the Al2O3 polishing liquid,and the surface roughness of the GeAsSe glass is 2.57 nm.It is concluded that this is the best polishing process.
分 类 号:TB321[一般工业技术—材料科学与工程]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.233