面向大面积微结构批量化制造的复合压印光刻  

Composite imprint lithography for mass producing large-area microstructures

作　　者：兰红波[1] 刘明杨 郭良乐 许权 LAN Hong-bo;LIU Ming-yang;GUO Liang-le;XU Quan(Shandong Engineering Research Center for Additive Manufacturing, Qingdao University of Technology, Qingdao 266520, China)

机构地区：[1]青岛理工大学山东省增材制造工程技术研究中心

出　　处：《光学精密工程》2019年第7期1516-1527,共12页Optics and Precision Engineering

基　　金：国家自然科学基金资助项目(51775288)

摘　　要：为了解决在大尺寸非平整刚性衬底和易碎衬底上高效低成本批量化制造大面积微纳结构这一难题,提出一种面向大面积微结构批量化制造的复合微纳压印光刻工艺。阐述了复合压印光刻的基本原理和工艺流程,通过实验揭示了主要工艺参数(覆模速度、压印力、压印速度、固化时间)对于压印结构的影响及规律。最后,利用课题组自主研发的复合压印光刻机,并结合优化的工艺参数,在3种不同的硬质基材(玻璃、PMMA、蓝宝石)上实现了微尺度柱状结构(最大图形区域为132mm×119mm)、微尺度光栅结构(最大直径为15.24cm的圆形区域)和纳尺度柱状结构(图形区域为47mm×47mm)的大面积微纳结构制造。研究结果表明,提出的复合微纳米压印工艺为大面积微纳结构宏量可控制备、以及大尺寸非平整刚性衬底/易碎衬底大面积图形化提供了一种全新的解决方案,具有广阔的工业化应用前景。To implement low-cost mass production of large-area micro/nanostructures on large-size rigid and fragile substrates, this study presents a novel composite nanoimprint lithography technique. First, the basic principle and process of the composite imprint lithography are described. Then, the effects and rules of the key process parameters (i.e., spreading speed of the flexible mold, imprint force, imprint speed, and curing time) on the imprinted patterns are revealed by a series of experiments. Finally, through a combination of the home-made composite imprinter and optimized process parameters, four typical cases are illustrated. We fabricated large-area micro/nanostructures on three rigid substrates (glass, polymethyl methacrylate, and sapphire), including microscale columnar structures (the largest graphic area is 132 mm× 119 mm), a microscale grating structure (the largest area is 6-inch round), and a nanoscale columnar structure (the graphic area is 47 mm× 47 mm). Experimental results show that the presented composite imprint lithography technique provides a novel way for the macroscopic quantity preparation of large-area micro/nanostructures and large-area patterning on rigid or fragile substrates, thus presenting a bright prospect for industrial applications.

关 键 词：复合微纳米压印光刻 大面积纳米压印 复合软模具 非平整衬底 大面积微结构 

分 类 号：TN305.7[电子电信—物理电子学]