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作 者:曾威 毛杰 马景涛 邓畅光 邓子谦 邓春明 宋鹏[3] ZENG Wei;MAO Jie;MA Jing-tao;DENG Chang-guang;DENG Zi-qian;DENG Chun-ming;SONG Peng(National Engineering Laboratory for Modern Materials Surface Engineering Technology,Guangdong Institute of New Materials,Guangzhou 510651,China;The Key Lab of Guangdong for Modern Surface Engineering Technology,Guangdong Institute of New Moterials,Guangzhou 510651,China;Faculty of Material Science and Engineering,Kunming University of Science and Technology,Kunming 650093,China)
机构地区:[1]广东省新材料研究所现代材料表面工程技术国家工程实验室,广州510651 [2]广东省新材料研究所广东省现代表面工程技术重点实验室,广州510651 [3]昆明理工大学材料科学与工程学院,昆明650093
出 处:《材料工程》2019年第8期161-168,共8页Journal of Materials Engineering
基 金:国家自然科学基金面上项目(51771059);广东省科技项目(2014B070705007,2017A070701027);广东省科学院项目(2017GDASCX-0111,2019GDASYL-0104022)
摘 要:研究基于等离子喷涂-物理气相沉积(PS-PVD)工艺的沉积表面的粗糙度对YSZ陶瓷层结构的影响,初步阐明了表面粗糙度对陶瓷层气相沉积过程的影响和涂层结构的形成规律。采用PS-PVD工艺在预制有NiCoCrAlYTa黏结层的K417G高温合金上制备YSZ陶瓷层;采用SEM、粗糙度检测仪、3D表面形貌仪等方法分析PS-PVD YSZ陶瓷涂层的形貌和结构特征。基体表面粗糙度对PS-PVD涂层结构有很大影响。结果表明:当基体表面粗糙度分别为 R a≤2μm, 2μm< R a<6μm, R a≥6μm时,涂层粗糙度分别在3.5~5,6~10,10~15μm区间;特征表面形貌"菜花头"的直径随着基体表面粗糙度的增加而逐渐增大, d P=38.5μm, d 280S =25.5μm, d 60S =38.7μm, d 24S =102μm, d S=137μm。表面粗糙度主要通过PS-PVD气相沉积过程中的阴影效应来影响涂层生长和形成差异性结构,随着基体表面粗糙度的增加,YSZ陶瓷层受阴影效应影响增大,表面形貌"菜花头"尺寸和柱状结构间间隙增大,形成更加疏松的结构。The effect of surface roughness based on PS-PVD process on the structure of YSZ ceramic coating was studied. The influence mechanism of surface roughness on gas-phase deposition and structure formation of ceramic coating was discussed. YSZ ceramic coating was prepared by PS-PVD process on K417G superalloy prefabricated with NiCoCrAlYTa bond coating. The morphology and structural characteristics of PS-PVD YSZ coating were analyzed by means of SEM, roughness detector and 3D surface topography instrument. Substrate surface roughness has a great influence on PS-PVD coating structure. When the surface roughness of the substrate is R a≤2μm, 2μm< R a<6μm, and R a≥ 6μm, respectively, the coating roughness is in the range of 3.5-5, 6-10μm and 10-15μm, respectively. The diameter of cauliflower head increases with the increase of the surface roughness of substrate. The d P=38.5μm, d 280S =25.5μm, d 60S =38.7μm, d 24S =102μm and d S=137μm. In the process of PS-PVD gas-phase deposition, surface roughness mainly affects the growth and formation of coating differential structures through shadow effect. With the increase of substrate surface roughness, YSZ ceramic coating is affected by shadow effect and the size of cauliflower head and the gap width between columnar structures are increased, forming a relatively loose structure.
关 键 词:等离子喷涂-物理气相沉积 热障涂层 YSZ陶瓷层 表面粗糙度
分 类 号:TG174.453[金属学及工艺—金属表面处理]
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