脉冲磁控溅射MoS2涂层的组织结构及摩擦学性能  

Structure and Tribological Properties of MoS2 Films Deposited by Unipolar Pulse Magnetron Sputtering

作　　者：但敏[1] 罗蓉蓉[1] 周毅 李建[1] 金凡亚[1] Dan Min;Luo Rongrong;Zhou Yi;Li Jian;Jin Fanya(Southwestern Institute of Physics,Chengdu 610041,China)

机构地区：[1]核工业西南物理研究院

出　　处：《稀有金属材料与工程》2019年第8期2716-2722,共7页Rare Metal Materials and Engineering

基　　金：四川省青年科技创新研究团队专项计划项目（2016TD0015）;四川省重点研发项目（18ZDYF2436)

摘　　要：采用单极性脉冲磁控溅射技术在A286基体表面制备MoS2低摩擦系数涂层(LFC)。利用XRD、SEM等手段表征涂层的成分与微观组织;采用原位纳米力学测试系统、球-盘式摩擦磨损试验机分析涂层的力学和摩擦学性能,并探讨了脉冲偏压对涂层结构、力学和摩擦学性能的影响。结果表明,脉冲偏压由300V增加到600V,MoS2涂层择优取向发生了(002)向(100)转变,当脉冲偏压增至800 V时又恢复(002)择优取向;随着脉冲偏压的增加,涂层的硬度及弹性模量出现先减小后增大趋势,摩擦系数在0.065~0.076范围内波动,呈现出先增大后减小趋势;偏压为800 V的涂层摩擦学性能最佳,其磨损率仅为基体的13.5%。MoS2 films were prepared on A286 substrate by unipolar pulse magnetron sputtering. The morphology, microstructure and composition of the films were characterized by scanning electron microscopy, X-ray diffractometer. The mechanical properties and tribological behavior in air of the films were investigated by nano-indentation tester and ball-on-disc tribotester. The effects of pulsed bias on microstructure, mechanical properties and tribological properties of MoS2 Films were analyzed. The results show that the preferential oriention of coatings changes from(002) to(100) in advance with the pulse bias voltage increasing from 300 V to 600 V. When the pulse bias voltage increase to 800 V, the preferential oriention renews to(002), and the film is of smooth and compact structure. With the pulse bias voltage increasing, the hardness and elastic modulus decrease firstly and increase afterward. The friction coefficient fluctuates in the range of 0.065~0.076 and shows the tendency of increasing firstly and decreasing afterward. When the bias voltage is 800 V, the friction performance is the best. The wearing rate is only 13.5% of the substrate, showing the lower friction coeffient and the good wearing resistance.

关 键 词：单极性脉冲磁控溅射 MOS2 力学性能 摩擦学性能 

分 类 号：TG132.32[一般工业技术—材料科学与工程] O539[金属学及工艺—合金]