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作 者:史昆玉[1] 张进中 张毅 万毅 SHI Kunyu;ZHANG Jinzhong;ZHANG Yi;WAN Yi(Department of Mechanical and Electrical Engineering, Wuhan Institute of Technology, Wuhan 430205, China)
机构地区:[1]武汉工程大学机电工程学院
出 处:《中国腐蚀与防护学报》2019年第4期313-318,共6页Journal of Chinese Society For Corrosion and Protection
基 金:武汉工程大学科学研究基金(k201519)~~
摘 要:采用双阴极等离子溅射沉积技术在TC4 (Ti-6Al-4V)合金基体表面制备了Nb2N涂层,利用XRD,SEM和EDS研究涂层的微观组织结构;使用划痕法测试了涂层与基体的结合力;采用开路电位(OCP)测量、动电位极化、电化学阻抗谱(EIS)等电化学测试技术,研究所制备的Nb2N薄膜在3.5%(质量分数) NaCl溶液中的电化学腐蚀行为,并与TC4基体进行比较。结果表明:所制备涂层分为过渡层和沉积层,涂层厚度约为21μm。涂层连续致密且光滑,没有明显孔洞或间隙。Nb2N涂层相较于TC4基体开路电位到达稳态值时间较短且稳态值较高;Nb2N涂层点腐蚀电位更高,腐蚀电流更低;涂层阻抗谱数据呈现单一容抗弧特性,容抗弧值高于TC4基体的,且相位角曲线最大值更大并且最大值处具有更宽的区间。Nb2N coating was deposited onto TC4(Ti-6Al-4V) substrates via a double cathode glow discharge plasma method. The microstructure of the coating was characterized by X-ray diffraction(XRD), scanning electron microscopy(SEM), and energy dispersive spectrometer(EDS). The adhesive property of Nb2N coating to the substrate was assessed by scratch test. While the electrochemical behavior in 3.5%(mass fraction) NaCl solution of the coating was investigated with electrochemical techniques,such as open circuit potential(OCP) measurement, potentiodynamic polarization and EIS. Result shows that the as-deposited coating of 21 μm in thickness is dense with a homogeneous microstructure without obvious voids or micro-crack. Compared with TC4 matrix, the open-circuit potential of Nb2N coating can reach a higher steady-state value within a shorter time interval, in other words, the coating presents higher corrosion potential(Ecorr) and lower corrosion current. The data of EIS show that the Nb2N coating shows a single capacitive reactance arc with higher capacitive reactance, larger phase angle maximum,as well as wider phase angle plateau, in the contrary to those of the bare TC4 Ti-alloy.
关 键 词:双阴极等离子溅射技术 Nb2N涂层 微观结构 耐腐蚀性能 TC4(Ti-6Al-4V)合金
分 类 号:TG174.445[金属学及工艺—金属表面处理]
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