氧气等离子体处理对铟锡氧化物薄膜表面性质的影响（英文）  

Influence of oxygen plasma treatment on the surface properties of indium-tin oxide thin films

作　　者：顾锦华 陆轴 康淮[2] GU Jinhua;LU Zhou;KANG Huai(Experimental Teaching and Laboratory Management Center,South-Central University for Nationalities,Wuhan 430074,China;College of Electronic Information Engineering,South-Central University for Nationalities,Wuhan 430074,China)

机构地区：[1]中南民族大学实验教学与实验室管理中心,武汉430074 [2]中南民族大学电子信息工程学院,武汉430074

出　　处：《中南民族大学学报（自然科学版）》2019年第3期445-451,共7页Journal of South-Central University for Nationalities：Natural Science Edition

基　　金：湖北省自然科学基金资助项目(2011CDB418);中央高校基本科研业务费专项资金资助项目(CZP17002)

摘　　要：采用氧气等离子体处理对铟锡氧化物(ITO)薄膜进行表面改性,基于化学组分、接触角、表面能和极性度的测试表征,研究了氧气等离子体处理对ITO表面性质的影响以及表面性能随放置时间的变化.实验结果表明:氧气等离子体处理有效去除了ITO表面的污染物,改善了ITO表面的化学组分、提高了表面能、极性度和润湿性,从而优化了ITO的表面性能.但是随着处理后放置时间的增加,ITO薄膜的表面能减小、极性度降低、润湿性退化,从而相应的表面性能也变差.The surfaces of indium-tin oxide(ITO)thin films were modified by oxygen plasma discharge.The effect of oxygen plasma treatment on the surface properties of ITO films and the changes in surface properties of treated ITO films with the ageing time were investigated through the measurements of chemical composition,contact angle,surface energy and polarity.Experimental results show that oxygen plasma treatment improves the stoichiometry of ITO surface,increases the surface energy and polarity,and enhances surface wettability of ITO,so as to improve the surface properties of ITO owing to the effective removal of the contaminants of the ITO surface.In addition,with the increment of ageing time after oxygen plasma treatment,the improved stoichiometry,surface energy and polarity of the ITO surface tend to decay,and the optimized ITO surface properties become worse and worse.

关 键 词：铟锡氧化物 氧气等离子体处理 表面性质 

分 类 号：TN304[电子电信—物理电子学]