微结构扩散膜光化学制备工艺  

Microstructure Diffusion Film Photochemical Preparation Technology

作　　者：赵长松 贺建芸[1] 谢鹏程[1] 李嘉维[1] 杨卫民[1] ZHAO Changsong;HE Jianyun;XIE Pengcheng;LI Jiawei;YANG Weimin(School of Mechanical and Electrical Engineering,Beijing University of Chemical Technology,Beijing 100029,China)

机构地区：[1]北京化工大学机电工程学院

出　　处：《塑料》2019年第5期111-113,127,共4页Plastics

基　　金：国家自然科学基金(51573017);宁波市产业技术创新及成果产业化重大项目(2013B10041)

摘　　要：介绍了一种新的微压印工艺,采用光固化微压印代替传统的成型方法进行微结构光扩散膜的制备,研究了制备工艺对微结构扩散膜的影响,探索了不同压力(分别为1.5、2、2.5、3、3.5N时)对光扩散膜微结构复制度的影响。当压印压力为3N时,微结构单元完整性良好,微结构复制度较高;探索了辐照时间(分别为3、4、5、6s时)对光扩散膜微结构复制度的影响。当辐照时间为6s时,光扩散膜微结构复制度良好;将预聚物百分比对光扩散膜透光率的影响进行了实验分析,在实验条件范围内,随着预聚物的百分比增大,制品透光率呈降低趋势。光固化微压印能够满足微结构光扩散膜批量化生产的要求,且相应的生产设备造价较低,降低了微结构光扩散膜的制作成本。A new micro-imprint lithography process was introduced.The preparation of microstructure optical diffusion film was carried out by using photocuring micro-imprint instead of traditional forming method.The influence of preparation process on the microstructure diffusion film was studied.The effects of different pressures (1.5,2,2.5,3,3.5 N) on the microstructure com plex system of optical diffusion film were investigated.When the impression pressure was 3 N,the integrity of the microstructural unit would be good,and the replication of the microstructure was high.And the influence of irradiation time (3,4,5,6 s) on the microstructural replicability of optical diffusion film.When the irradiation time was 6 s,the microstructure of the optical diffusion film was good.At the same time,the influence of the percentage of prepolymer on the transmittance of the optical diffusion film was analyzed experimentally.In the range of experim ental conditions,as the percentage of prepolymer in creases,the transmittance of the product tended to decrease.The photocurable microimprint could meet the requirements of mass production of microstructure optical diffusion film.Moreover,the corresponding production equipment cost was not high,which reduced the production cost of microstructure optical diffusion film.

关 键 词：光扩散膜 光固化 微压印 光化学制造 微结构 

分 类 号：TQ316.312[化学工程—高聚物工业]