1.55μm DFB半导体激光器亚微米光栅  

Submicrometer Grating for 1.55μm Wavelength DFB Semiconductor Laser

作　　者：王品红[1] 易向阳[1] 

机构地区：[1]重庆光电技术研究所,重庆永川632163

出　　处：《半导体光电》1992年第2期120-125,共6页Semiconductor Optoelectronics

摘　　要：论述了用全息技术制作1.55μm 分布反馈半导体激光器亚微米光栅的过程;优化工艺后,获得了高质量的光栅。建立了简单而准确的光栅周期测试系统。This paper describes the fabrication process of submicrometer grating for 1.55μm distributed feedback lasers by holographic technique.The technology has been optimized with which high-quality gratings are obtained.A simple and accurate system is cstablished for the measuremcnt of grating period.

关 键 词：光栅 全息技术 测试 半导体 激光器 

分 类 号：TN248.4[电子电信—物理电子学]