Nonlinear properties of fractal growth of thin films at low temperature  

作　　者：FengminWU JiefangZHANG 等 

机构地区：[1]ResearchCenterofScience,ZhejiangUniversityofTechnology,Hangzhou310014,China [2]InstituteofNonlinearPhysics,ZhejiangNormalUniversity,Jinhua321004,China

出　　处：《Communications in Nonlinear Science and Numerical Simulation》2001年第2期61-67,共7页非线性科学与数值模拟通讯（英文版）

摘　　要：Fractal growth of thin films at low temperature (75-200 K) is simulated by kinetic Monte Carlo method, using realistic growth model-Ag on Pt(111) surface and physical parameters. It is shown that the fractal growth of thin films is nonlinear, i. e., the island size S(t) grows with time t as tk ) where the growth exponent k is slightly less than 1 because of the growth competition of islands and the competition between nucleation and growth of islands. The further results indicate that the branch width of islands b increases with increasing island size S as b -Sa, where a is approximately equal to 1/3 because of the geometrical structure of the triangular substrate.Fractal growth of thin films at low temperature (75-200 K) is simulated by kinetic Monte Carlo method, using realistic growth model-Ag on Pt(111) surface and physical parameters. It is shown that the fractal growth of thin films is nonlinear, i. e., the island size S(t) grows with time t as tk ) where the growth exponent k is slightly less than 1 because of the growth competition of islands and the competition between nucleation and growth of islands. The further results indicate that the branch width of islands b increases with increasing island size S as b -Sa, where a is approximately equal to 1/3 because of the geometrical structure of the triangular substrate.

关 键 词：fractal growth thin film Monte Carlo method 

分 类 号：O484.1[理学—固体物理]