氢水平衡法制备二氧化钒薄膜及XPS能谱分析  

Preparation of VO_2 Thin Films by H_2/H_2O Equilibrium Method and XPS Analysis

作　　者：葛欣[1] 尚志航[1] 秦岩[1] 卢志玉[1] 

机构地区：[1]沈阳医学院化学教研室,沈阳市黄河北大街146号110034

出　　处：《光谱实验室》2002年第6期819-821,共3页Chinese Journal of Spectroscopy Laboratory

摘　　要：采用溶胶 -凝胶法 ,结合氢水平衡还原处理得到了二氧化钒薄膜 ,对薄膜的 XPS能谱分析及对反应体系的热力学分析表明 。VO 2 thin films were prepared by the sol gel method followed by the H 2/H 2O equilibrium reduction treatment. The films were analyzed by the X ray photoelectron spectrometry (XPS) techniques. The XPS results and the thermodynamic analysis show that the H 2/H 2O equilibrium method is a practical way to prepare VO 2 thin films.

关 键 词：制备 XPS能谱 分析 溶胶-凝胶法 氢水平衡法 二氧化钒薄膜 X射线光电子能谱 热力学 

分 类 号：O484.5[理学—固体物理] TB383[理学—物理]